IP Library Assignment 016277/0180
Patent Assignment
Reel/Frame 016277/0180

Assignment of Assignor's Interest

Recorded: 2005-02-17 Pages: 4
Assignors
MOORS, JOHANNES HUBERTUS JOSEPHINA
Executed: 2005-02-02
MICKAN, UWE
Executed: 2005-02-02
SINGER, WOLFGANG
Executed: 2005-01-19
MANN, HANS-JUERGEN
Executed: 2005-01-19
Assignees
ASML NETHERLANDS B.V.
DE RUN 6501, NL-5504 DR VELDHOVEN, NETHERLANDS
CARL ZEISS SMT AG
CARL ZEISS STRASSE 22, 73447 OBERKOCHEN, GERMANY
Covered Property (1)
Lithographic System, Method for Adapting Transmission Characteristics of an Optical Pathway Within a Lithographic System, Semiconductor Device, Method of Manufacturing a Reflective Element for Use in a Lithographic System, and Reflective Element Manufactured Thereb
Patent: 7,369,216 →
Application: 10/964,817 →
Publication: US 2006/0082751
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
A Modifying Conversion Jan 18, 2011
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT GMBH
Reel/Frame 025763/0367 →