Patent Assignment
Reel/Frame 025763/0367
A Modifying Conversion
Recorded: 2011-01-18
Pages: 28
Assignor
CARL ZEISS SMT AG
Executed: 2010-10-14
Assignee
CARL ZEISS SMT GMBH
RUDOLF-EBER-STRASSE 2, 73447 OBERKOCHEN, GERMANY
Covered Properties
(739)
Projection Objective for Microlithography
Catadioptric Projection Objective with Geometric Beam Splitting
Application:
12/194,005 →
Publication:
US US20080316456A1
Catadioptric Projection Objective with Geometric Beam Splitting
Microlithographic Reduction Projection Catadioptric Objective
Apparatus for Wavefront Detection
Apparatus for Wavefront Detection
Application:
12/032,623 →
Publication:
US US20080144043A1
Multilayer System with Protecting Layer System and Production Method
Iris Diaphragm
Method for the Production of Multi-Layer Systems
Projection Lens, in Particular for Microlithography
Reduction Objective for Extreme Ultraviolet Lithography
Device for Mounting an Optical Element, for Example a Lens Element in a Lens
6-Mirror Microlithography Projection Objective
Projection Exposure System
Spectrometer Arrangement
Optical Arrangement and Projection Exposure System for Microlithography with Passive Thermal Compensation
Optical Element and Method for Recovering the Substrate
Optical Element Deformation System
Illumination System with a Grating Element
Illumination System Particularly for Microlithography
Temperature Compensation Apparatus for Thermally Loaded Bodies of Low Thermal Conductivity
Mounting Apparatus for an Optical Element
Projection System for Euv Lithography
Lithographic Objective Having a First Lens Group Including Only Lenses Having a Positive Refractive Power
Adjusting Apparatus for an Optical Element in a Lens System
Projection System for Euv Lithography
Collector for an Illumination System with a Wavelength of Less Than or Equal to 193 Nm
Narrow-Band Spectral Filter and the Use Thereof
System for Damping Oscillations
Lithographic Projection Apparatus, a Grating Module, a Sensor Module, a Method of Measuring Wave Front Aberrations
Optical Beam Guidance System and Method for Preventing Contamination of Optical Components Contained Therein
Particle-Optical Lens Arrangement and Method Employing Such a Lens Arrangement
Method and Apparatus for Analysis of Schlieren
Adjusting Apparatus for Devices and for Setting Adjustments
Apparatus for Mounting an Optical Element in an Optical System
Particle-Optical Apparatus, Illumination Apparatus and Projection System as Well as a Method Employing the Same
Apparatus for Tilting a Carrier for Optical Elements
Very High-Aperture Projection Objective
Very High-Aperture Projection Objective
Objective with Fluoride Crystal Lenses
Optical Imaging System with Polarizer and a Crystalline-Quartz Plate for Use Therewith
Polarization Rotator and a Crystalline-Quartz Plate for Use in an Optical Imaging System
Polarization Rotator and a Crystalline-Quartz Plate for Use in an Optical Imaging System
Polarizer and Microlithography Projection System with a Polarizer
Optically Polarizing Retardation Arrangement, and a Microlithography Projection Exposure Machine
Examining System for the Particle-Optical Imaging of an Object, Deflector for Charged Particles as Well as Method for the Operation of the Same
Lithographic Apparatus and Device Manufacturing Method
Objective with Lenses Made of a Crystalline Material
Illumination System Particularly for Microlithography
Collector with Fastening Devices for Fastening Mirror Shells
Method for Optically Detecting Deviations of an Image Plane of an Imaging System from the Surface of a Substrate
Adjustment Arrangement of an Optical Element
Adjustment Arrangement of an Optical Element
Adjustment Arrangement of an Optical Element
Substrate Material for X-Ray Optical Components
Method of Making a Fracture-Resistant Calcium Fluoride Single Crystal and Its Use
Projection Exposure System
Projection Exposure System
Zoom System, in Particular, a Zoom System for an Illumination Device of a Microlithographic Projection System
Zoom System for an Illumination Device
Method and Coating System for Coating Substrates for Optical Components
Method for Optimizing the Image Properties of at Least Two Optical Elements as Well as Methods for Optimizing the Image Properties of at Least Three Optical Elements
Method and Apparatus for Polishing or Lapping an Aspherical Surface of a Work Piece
Patent:
6,733,369 →
Application:
10/261,455 →
Facet Mirror Having a Number of Mirror Facets
Method and System for Measuring the Imaging Quality of an Optical Imaging System
Lens Made of a Crystalline Material
Interferometric Measurement Device for Determining the Birefringence in a Transparent Object
Patent:
7,212,289 →
Application:
10/299,030 →
Imaging Device in a Projection Exposure Facility
Objective with Birefringent Lenses
Projection Lens for a Microlithographic Projection Exposure Apparatus
Facet Mirror Having a Number of Mirror Facets
Illumination System Having a Nested Collector for Annular Illumination of an Exit Pupil
Method for Correcting Oscillation-Induced Imaging Errors in an Objective
Method for Improving an Optical Imaging Property of a Projection Objective of a Microlithographic Projection Exposure Apparatus
Method for Improving an Optical Imaging Property of a Projection Objective of a Microlithographic Projection Exposure Apparatus
Refractive Projection Objective with a Waist
Objective, in Particular a Projection Lens for Microlithography
Collector Unit with a Reflective Element for Illumination Systems with a Wavelength of Smaller Than 193 Nm
Moire Method and Measuring System for Measuring the Distortion of an Optical Imaging System
Refractive Projection Objective for Immersion Lithography
Projection Exposure Method and Projection Exposure System
Device, Euv-Lithographic Device and Method for Preventing and Cleaning Contamination on Optical Elements
Method and Device for Decontaminating Optical Surfaces
Objective with Crystal Lenses
6-Mirror Projection Objective with Few Lenses
Device for the Low-Deformation Mounting of a Rotationally Asymmetric Optical Element
Projection Method Including Pupillary Filtering and a Projection Lens Therefor
Projection Method Including Pupillary Filtering and a Projection Lens Therefor
Optical System and Photolithography Tool Comprising Same
Very-High Aperture Projection Objective
Illumination System with a Plurality of Light Sources
Projection Exposure System
Reflective X-Ray Microscope and Inspection System for Examining Objects with Wavelengths Less Than or Equal to 100 Nm
Optical System Having an Optical Element That Can Be Brought into at Least Two Positions
Method for Determining Wavefront Aberrations
Method for Determining Wavefront Aberrations
Projection Objective, Especially for Microlithography, and Method for Adjusting a Projection Objective
Projection Objective, Especially for Microlithography, and Method for Adjusting a Projection Objective
Apparatus for Polarization-Specific Examination, Optical Imaging System, and Calibration Method
Method and Apparatus for Determining the Influencing of the State of Polarization by an Optical System; and an Analyser
Method and Apparatus for Spatially Resolved Polarimetry
Catadioptric Objective Comprising Two Intermediate Images
Patent:
41,350 →
Application:
11/183,303 →
Attenuator for Attenuating Wavelengths Unequal to a Used Wavelength
Diffuser, Wavefront Source, Wavefront Sensor and Projection Exposure Apparatus
Method for Calibrating an Interferometer Apparatus, for Qualifying an Optical Surface, and for Manufacturing a Substrate Having an Optical Surface
Patent:
7,050,175 →
Application:
10/637,217 →
Projection Objectives Including a Plurality of Mirrors with Lenses Ahead of Mirror M3
Illumination System Having a More Efficient Collector Optic
Lithographic Apparatus and Device Manufacturing Method
Oblique Mirror-Type Normal-Incidence Collector System for Light Sources, Particularly Euv Plasma Discharge Sources
Oblique Mirror-Type Normal-Incidence Collector System for Light Sources, Particularly Euv Plasma Discharge Sources
Application:
12/823,403 →
Publication:
US US20100259742A1
Mounting Apparatus for an Optical Element
Patent:
6,816,325 →
Application:
10/661,183 →
Masks, Lithography Device and Semiconductor Component
Masks, Lithography Device and Semiconductor Component
Device and Method for Range-Resolved Determination of Scattered Light, and an Illumination Mask
Device for the Range-Resolved Determination of Scattered Light, Operating Method, Illumination Mask and Image-Field Mask
Method of Determining Optical Properties and Projection Exposure System Comprising a Wavefront Detection System
Projection Objective
Compact 1 1/2-Waist System for Sub 100NM Arf Lithography
Projection Objective for Immersion Lithography
Refractive Projection Objective for Immersion Lithography
Microlithographic Exposure Method as Well as a Projection Exposure System for Carrying Out the Method
Microlithographic Exposure Method as Well as a Projection Exposure System for Carrying Out the Method
Phase Shifting Wavefront Interference Method
Patent:
7,119,910 →
Application:
10/697,239 →
Hermetically Sealed Elements of an Actuator
Projection Objective Having Adjacently Mounted Aspheric Lens Surfaces
Multilayer System with Protecting Layer System and Production Method
Lithographic Apparatus and Device Manufacturing Method
Lithographic Apparatus and Device Manufacturing Method
Method of Processing an Optical Element Using an Interferometer Having an Aspherical Lens That Transforms a First Spherical Beam Type into a Second Spherical Beam Type
Patent:
7,342,667 →
Application:
10/721,232 →
Optical Subassembly and Projection Objective in Semiconductor Lithography
Protective Coating System for Reflective Optical Elements, Reflective Optical Element and Method for the Production Thereof
Optical System for Providing a Useful Light Beam Influenced by Polarization
Method of Producing an Optical Imaging System
Device for Holding Measurement Instruments
Objective with Lenses Made of a Crystalline Material
Optical Apparatus for Use in Photolithography
Diaphragm Changing Device
Diaphragm Changing Device
Method for Cleaning a Surface of a Component of a Lithographic Projection Apparatus, Lithographic Projection Apparatus, Device Manufacturing Method and Cleaning System
Apparatus and Method for Measuring an Optical Imaging System, and Detector Unit
Patent:
7,088,458 →
Application:
10/743,107 →
Processes and device for the deposition of films on substrates
Application:
10/754,151 →
Publication:
US US20050150758A1
Processes and Device for the Deposition of Films on Substrates
Euv Illumination System Having a Plurality of Light Sources for Illuminating an Optical Element
Device and Method for Wavefront Measurement of an Optical Imaging System, and a Microlithography Projection Exposure Machine
Method for the Production of a Facetted Mirror
Catadioptric Projection Objective with Adaptive Mirror and Projection Exposure Method
Apparatus and Method for Measuring the Wavefront of an Optical System
Patent:
7,336,371 →
Application:
10/766,014 →
Catadioptric Projection System for 157 Nm Lithography
Method for Producing an Aspherical Optical Element
Microlithographic Projection Exposure Apparatus with Immersion Projection Lens
Reflective Optical Element and Euv Lithography Appliance
Method for Distortion Correction in a Microlithographic Projection Exposure Apparatus
Method for Distortion Correction in a Microlithographic Projection Exposure Apparatus
Objective with Fluoride Crystal Lenses
Device and Method for Wavefront Measurement of an Optical Imaging System by Means of Phase-Shifting Interferometry
Method of Manufacturing an Optical Component
Illumination System for Microlithography
Support Device for Positioning an Optical Element
Housing Structure
Illumination System with Field Mirrors for Producing Uniform Scanning Energy
Method of Manufacturing an Optical Element
Microlithographic Projection Exposure Apparatus
Microlithographic Projection Exposure Apparatus
Application:
12/611,999 →
Publication:
US US20100045952A1
Correcting Device to Compensate for Polarization Distribution Perturbations
Lithographic Objective Having a First Lens Group Including Only Lenses Having a Positive Refractive Power
Projection Lens for a Microlithographic Projection Exposure Apparatus
Optical Imaging Device Having at Least One System Diaphragm
Method of Producing Aspherical Optical Surfaces
Apparatus for Scattered Light Inspection of Optical Elements
Lithography Lens System and Projection Exposure System Provided with at Least One Lithography Lens System of This Type
Lithographic Apparatus and Device Manufacturing Method
Lithographic Appararus and Method
Illumination System and Polarizer for a Microlithographic Projection Exposure Apparatus
Illumination System and Polarizer for a Microlithographic Projection Exposure Apparatus
Projection Exposure System Having a Reflective Reticle
Patent:
40,743 →
Application:
10/916,650 →
Projection Exposure Machine Comprising a Projection Lens
Projection Objective for Microlithography
Multi Mirror System for an Illumination System
Device for Preventing the Displacement of an Optical Element
Optical Assembly Structure Comprising a Connecting Body with Thermal Expansion Compensation Means
Application:
11/579,458 →
Publication:
US US20080193201A1
Refractive Projection Objective
Refractive Projection Objective
Apparatus for Manipulation of an Optical Element
Illumination System for a Microlithography Projection Exposure Installation
Application:
12/758,554 →
Publication:
US US20100195077A1
Illumination System for a Microlithography Projection Exposure Installation
Projection Objective for Microlithography
Holding and Positioning Apparatus for an Optical Element
Method of Manufacturing an Optical Element
Patent:
7,118,449 →
Application:
10/943,952 →
Mirror for Use in a Projection Exposure Apparatus
Patent:
7,481,543 →
Application:
11/523,396 →
Lithographic Apparatus and Device Manufacturing Method
Lithographic Apparatus and Device Manufacturing Method
Lithographic Apparatus and Device Manufacturing Method
Lithographic Apparatus and Device Manufacturing Method
Lithographic Apparatus and Device Manufacturing Method
Catadioptric Projection Objective
Replacement Apparatus for an Optical Element
Lithographic Apparatus and Device Manufacturing Method
Lithographic Apparatus and Device Manufacturing Method
Lithographic System, Method for Adapting Transmission Characteristics of an Optical Pathway Within a Lithographic System, Semiconductor Device, Method of Manufacturing a Reflective Element for Use in a Lithographic System, and Reflective Element Manufactured Thereb
Method of Manufacturing an Optical System
Patent:
7,133,225 →
Application:
10/965,909 →
Flange Assembly of an Optical System
Optically Polarizing Retardation Arrangement, and Microlithography Projection Exposure Machine
Holding Device for an Optical Element in an Objective
Optical System and Method for the Production of Microstructured Components by Microlithography
Projection Optical System
Refractive Projection Objective for Immersion Lithography
Microlithography Projection Objective with Crystal Lens
Projection Objective and Method for Its Manufacture
Projection Objective and Method for Its Manufacture
Optical System, in Particular Illumination System, of a Microlithographic Projection Exposure Apparatus
Optical Units
Optical Component, Comprising a Material with a Predetermined Homogeneity of Thermal Expansion
Beam Reshaping Unit for an Illumination System of a Microlithographic Projection Exposure Apparatus
Projection Objective for Immersion Lithography
Polarized Radiation in Lithographic Apparatus and Device Manufacturing Method
Polarized Radiation in Lithographic Apparatus and Device Manufacturing Method
Phase Shifting Interferometric Method, Interferometer Apparatus and Method of Manufacturing an Optical Element
Objective with Fluoride Crystal Lenses
Device and Method for the Optical Measurement of an Optical System, Measurement Structure Support, and Microlithographic Projection Exposure Apparatus
Imaging System for a Microlithographical Projection Light System
Catadioptric Projection Objective
Catadioptric Projection Objective
Catadioptric Projection Objective
Catadioptric Projection Objective
Catadioptric Projection Objective
Illumination Apparatus for Microlithographyprojection System Including Polarization-Modulating Optical Element
Polarization-Modulating Optical Element
Polarization-Modulating Optical Element
Polarization-Modulating Optical Element
Method of Calibrating an Interferometer Optics and of Processing an Optical Element Having an Optical Surface
Patent:
7,436,520 →
Application:
11/035,723 →
Device and Method for the Determination of Imaging Errors and Microlithography Projection Exposure System
Projection Objective for a Microlithographic Projection Exposure Apparatus
Optical Component That Includes a Material Having a Thermal Longitudinal Expansion with a Zero Crossing
Lithographic Apparatus and Device Manufacturing Method
Projection Objective of a Microlithographic Projection Exposure Apparatus
Application:
12/467,879 →
Publication:
US US20090225296A1
Projection Objective of a Microlithographic Projection Exposure Apparatus
Illumination System for a Microlithographic Projection Exposure Apparatus
Application:
11/814,929 →
Publication:
US US20090009744A1
Optical Component and Coating System for Coating Substrates for Optical Components
Microlithographic Projection Exposure Apparatus
Application:
11/814,928 →
Publication:
US US20080192224A1
Illumination System for a Microlithographic Projection Exposure Apparatus
Structure for Use in a Projection Exposure System for Manufacturing Semiconductors
System for Reducing the Coherence of Laser Radiation
Objective with at Least One Optical Element
Illumination System for a Microlithography Projection Exposure Installation
Device Consisting of at Least One Optical Element
Device Consisting of at Least One Optical Element
Transmission Filter Apparatus
Methods For Manufacturing Reflective Optical Element, Reflective Optical Elements, Euv-Lithography Apparatuses And Methods For Operating Optical Elements And Euv-Lithography Apparatuses, Methods For Determining The Phase Shift, Methods For Determining The Layer Thickness, And Apparatuses For Carrying Out The Methods
Application:
10/598,481 →
Publication:
US US20070285643A1
Apparatus for Providing a Pattern of Polarization
Projection Objective Having Adjacently Mounted Aspheric Lens Surfaces
Method for a Multiple Exposure, Microlithography Projection Exposure Installation and a Projection System
Method for a Multiple Exposure, Microlithography Projection Exposure Installation and a Projection System
Method for a Multiple Exposure, Microlithography Projection Exposure Installation and a Projection System
Device and Method for the Optical Measurement of an Optical System by Using an Immersion Fluid
Device and Method for the Optical Measurement of an Optical System by Using an Immersion Fluid
Projection Objective, Projection Exposure Apparatus and Reflective Reticle for Microlithography
Refractive Projection Objective for Immersion Lithography
Imaging System with Mirror Group
Illumination System for a Wavelength of Less Than or Equal to 193 Nm, with Sensors for Determining an Illumination
Projection Objective of a Microlithographic Exposure Apparatus
Catadioptric Projection Objective with Mirror Group
Catadioptric Projection Objective
Objective with Pupil Obscuration
Method for Adjusting a Projection Objective
Polarized Radiation in Lithographic Apparatus and Device Manufacturing Method
Method of Optimizing Imaging Performance
Optical Element
Closing Module for an Optical Arrangement
Optical Element Unit for Exposure Processes
Method for Connection of an Optical Element to a Mount Structure
Device for Holding a Beam Splitter Element
High Positioning Reproducible Low Torque Mirror - Actuator Interface
High Positioning Reproducible Low Torque Mirror - Actuator Interface
Application:
12/712,808 →
Publication:
US US20100149671A1
Substrate-Coating System and an Associated Substrate-Heating Method
Patent:
7,166,168 →
Application:
11/120,195 →
Catadioptric Projection Objective with Intermediate Images
Monocrystalline Optical Component with Curved Surface and Multilayer Coating
Optical Module for a Microlithography Objective Including Holding and Supporting Devices
Method for Determining Distortion and/or Image Surface
Projection Objective for a Microlithographic Projection Exposure Apparatus
System for Measuring the Image Quality of an Optical Imaging System
System for Measuring the Image Quality of an Optical Imaging System
System for Measuring the Image Quality of an Optical Imaging System
Projection System with Compensation of Intensity Variations and Compensation Element Therefor
Method and Apparatus for Determining Telecentricity and Microlithography Projection Exposure Apparatus
Projection Objective Having a High Aperture and a Planar End Surface
Projection Objective Having a High Aperture and a Planar End Surface
Positioning Unit and Alignment Device for an Optical Element
Positioning Unit and Alignment Device for an Optical Element
Projection Lens for Microlithography and Corresponding Terminal Element
Application:
11/993,422 →
Publication:
US US20100149500A1
Illumination System for Microlithography
Catadioptric Projection Objective
Catadioptric Projection Objective
Catadioptric Projection Objective
Catadioptric Projection Objective
Projection Exposure Method and Projection Exposure System Therefor
Method of Determining Lens Materials for a Projection Exposure Apparatus
Reflective Projection Lens for Euv-Photolithography
Optical System of a Microlithographic Projection Exposure Apparatus
Optical System of a Microlithographic Projection Exposure Apparatus
Optical System of a Microlithographic Projection Exposure Apparatus
Projection Objective for Microlithography
Illumination System of a Microlithographic Exposure Apparatus
Filter Device for the Compensation of an Asymmetric Pupil Illumination
Filter Device for the Compensation of an Asymmetric Pupil Illumination
Projection Optical System and Method
Method for Improving the Imaging Properties of a Projection Objective for a Microlithographic Projection Exposure Apparatus
Microlithographic Projection Exposure Apparatus
Application:
11/573,628 →
Publication:
US US20110134403A1
Method and Apparatus for Setting Optical Imaging Properties by Means of Radiation Treatment
Method of Processing an Optical Substrate
Patent:
7,167,251 →
Application:
11/230,455 →
Optical System, Method of Manufacturing an Optical System and Method of Manufacturing an Optical Element
Patent:
7,605,926 →
Application:
12/197,035 →
Device for the Low-Deformation Replaceable Mounting of an Optical Element
Device for the Low-Deformation Replaceable Mounting of an Optical Element
Arrangement of Optical Elements in a Microlithographic Projection Exposure Apparatus
Method for Correcting Astigmatism in a Microlithography Projection Exposure Apparatus, a Projection Objective of Such a Projection Exposure Apparatus, and a Fabrication Method for Micropatterned Components
Patent:
7,522,260 →
Application:
11/239,266 →
Optical System and Method for Improving Imaging Properties Thereof
Projection System for Euv Lithography
Collector Having Unused Region for Illumination Systems Using a Wavelength Less Than or Equal to 193 Nm
Optical Component Having an Improved Transient Thermal Behavior and Method for Improving the Transient Thermal Behavior of an Optical Component
Optical Component Having an Improved Transient Thermal Behavior and Method for Improving the Transient Thermal Behavior of an Optical Component
Catadioptric Objective
Patent:
42,570 →
Application:
11/247,002 →
Projection Exposure System and Method of Manufacturing a Miniaturized Device
Six Degree of Freedom (Dof) Actuator Reaction Mass
Application:
11/718,132 →
Optical System for Ultraviolet Light
Projection Exposure Apparatus for Microlithography
Application:
11/577,531 →
Publication:
US US20090213342A1
Projection Exposure Apparatus and Projection Optical System
Reflective Optical Element, Optical System and Euv Lithography Device
Optical Measuring Apparatus and Operating Method for Imaging Error Correction in an Optical Imaging System
Optical Beam Transformation System and Illumination System Comprising an Optical Beam Transformation System
Projection Lens System of a Microlithographic Projection Exposure Installation
Projection Lens System of a Microlithographic Projection Exposure Installation
Method of Manufacturing a Miniaturized Device
Microlithographic Projection Exposure Apparatus
Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light
Method of Manufacturing a Miniaturized Device
Method of Manufacturing a Miniaturized Device
Transmitting Optical Element and Objective for a Microlithographic Projection Exposure Apparatus
Imaging Systems
Composite Body
Application:
12/842,624 →
Publication:
US US20100284652A1
Objectives as a Microlithography Projection Objective with at Least One Liquid Lens
Imaging Device in a Projection Exposure Machine
Apparatus for Mounting Two or More Elements and Method for Processing the Surface of an Optical Element
Catoptric Objectives and Systems Using Catoptric Objectives
Catoptric Objectives and Systems Using Catoptric Objectives
Lens Module Comprising at Least One Exchangeable Optical Element
Lithographic Apparatus, System and Device Manufacturing Method
Projection Optical System
Illumination System for a Microlithographic Projection Exposure Apparatus
Application:
11/813,529 →
Publication:
US US20080111983A1
Hologram and Method of Manufacturing an Optical Element Using a Hologram
Optical Assembly
Optical Assembly
Lithographic Apparatus, Device Manufacturing Method and Exchangeable Optical Element
Method and System for Indirect Determination of Local Irradiance in an Optical System
Method and System for Indirect Determination of Local Irradiance in an Optical System
Projection System, in Particular for a Microlithographic Projection Exposure Apparatus
Refractive Optical Imaging System, in Particular Projection Objective for Microlithography
Vibration Damping for Photolithographic Lens Mount
Lithographic Objective Having a First Lens Group Including Only Lenses Having a Positive Refractive Power
Projection Objectives Including a Plurality of Mirrors with Lenses Ahead of Mirror M3
Illumination System, In Particular For A Projection Exposure Machine In Semiconductor Lithography
Application:
11/814,685 →
Publication:
US US20080273186A1
Method for Describing, Evaluating and Improving Optical Polarization Properties of a Microlithographic Projection Exposure Apparatus
Patent:
7,728,975 →
Application:
11/358,119 →
Optical Composite Material and Method for Its Production
Optical System, in Particular Objective or Illumination System for a Microlithographic Projection Exposure Apparatus
Application:
11/813,902 →
Publication:
US US20080198455A1
Particle-Optical Systems and Arrangements and Particle-Optical Components for Such Systems and Arrangements
Microlithography Projection System with an Accessible Diaphragm or Aperture Stop
Optical Element Unit
System and Method for Determining a Shape of a Surface of an Object and Method of Manufacturing an Object Having a Surface of a Predetermined Shape
Methods and Apparatus for Measuring Wavefronts and for Determining Scattered Light, and Related Devices and Manufacturing Methods
Illumination System Particularly for Microlithography
Process for Connecting an Optical Element of a Microlithographic Projection Exposure Apparatus to a Mount, and Assembly
Objective with Fluoride Crystal Lenses
Reflecting Optical Element with Eccentric Optical Passageway
Projection Objective of a Microlithographic Projection Exposure Apparatus and Method for Its Production
Optical Imaging Device
Projection Exposure System, Method for Manufacturing a Micro-Structured Structural Member by the Aid of Such a Projection Exposure System and Polarization-Optical Element Adapted for Use in Such a System
Device for Adjusting the Illumination Dose on a Photosensitive Layer
Optical Element for Correction of Aberration, and a Lithographic Apparatus Comprising Same
Illumination System for a Microlithgraphic Exposure Apparatus
Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors
Application:
11/919,858 →
Publication:
US US20090213345A1
Projection Objective
Collector with Fastening Devices for Fastening Mirror Shells
Microlitographic Projection Exposure Apparatus and Immersion Liquid Therefore
Application:
12/190,007 →
Publication:
US US20080304032A1
Assembly for Adjusting an Optical Element
Application:
11/914,055 →
Publication:
US US20090207511A1
Six-Mirror Euv Projection System with Low Incidence Angles
Optical Apparatus Comprising an Optical Component and an Adjustment Device and Method for Influencing a Polarization State of the Optical Component
Optical System of a Microlithographic Projection Exposure Apparatus
Application:
12/188,652 →
Publication:
US US20080309904A1
Optical System of a Microlithographic Projection Exposure Apparatus
Reflective Optical Element for Ultraviolet Radiation, Projection Optical System and Projection Exposure System Therewith, and Method for Forming the Same
Lithographic Apparatus and Device Manufacturing Method
Optical Scattering Disk, Use Thereof, and Wavefront Measuring Apparatus
Method of Aligning an Optical System
Microlithography projection objective
Application:
11/916,162 →
Publication:
US US20090115986A1
Optical Element for Radiation in the Euv and/or Soft X-Ray Region and an Optical System with at Least on Optical Element
Optical Element for Radiation in the Euv and/or Soft X-Ray Region and an Optical System with at Least One Optical Element
Method for Improving the Imaging Properties of a Projection Objective, and Such a Projection Objective
Method for Improving the Imaging Properties of a Projection Objective, and Such a Projection Objective
Projection Objective Adapted for Use with Different Immersion Fluids or Liquids, Method of Conversion of Such and Production Method
Polarization-Modulating Optical Element
Polarization-Modulating Optical Element
Application:
12/814,269 →
Publication:
US US20110188019A1
Polarization-Modulating Optical Element
Polarization-Modulating Optical Element
Imaging System, in Particular for a Microlithographic Projection Exposure Apparatus
Lithography Projection Objective, and a Method for Correcting Image Defects of the Same
Lithography Projection Objective, and a Method for Correcting Image Defects of the Same
Lithography Projection Objective, and a Method for Correcting Image Defects of the Same
Optical Element Module
Projection Exposure System With Different Exposure Configurations Having Different Image Side Numerical Apertures and Different Image Field Sizes
Application:
11/951,746 →
Publication:
US US20080151211A1
Optical Imaging Arrangement
Optical Imaging Arrangement
Optical Element with an Antireflection Coating, Projection Objective, and Exposure Apparatus Comprising Such an Element
Pellicle for Use in a Microlithographic Exposure Apparatus
Application:
11/994,747 →
Publication:
US US20090059189A1
Double-Facetted Illumination System with Attenuator Elements on the Pupil Facet Mirror
Application:
11/961,431 →
Publication:
US US20080165925A1
Lens Comprising a Plurality of Optical Element Disposed in a Housing
Projection Exposure Apparatus and Method for Operating the Same
Method and System for Measuring the Imaging Quality of an Optical Imaging System
Method for correcting a lithography projection objective, and such a projection objective
Application:
11/479,574 →
Publication:
US US20070019305A1
Arrangement for Mounting an Optical Element
Method and Means for Determining the Shape of a Rough Surface of an Object
Patent:
7,403,290 →
Application:
11/541,180 →
Illumination System of a Microlithographic Projection Exposure Apparatus, and Depolarizer
Application:
12/540,107 →
Publication:
US US20090296066A1
Optical Element
Application:
11/994,482 →
Publication:
US US20080278828A1
Microlithographic Projection Exposure Apparatus and Measuring Device for a Projection Lens
Application:
12/195,566 →
Publication:
US US20080309894A1
Exposure Apparatus and Measuring Device for a Projection Lens
Optical Element Module
Application:
12/951,777 →
Publication:
US US20110063590A1
Optical Element Module
Projection Objective of a Microlithographic Projection Exposure Apparatus
Projection Objective of a Microlithographic Projection Exposure Apparatus
Imaging System, in Particular a Projection Objective of a Microlithographic Projection Exposure Apparatus
Projection Objective for a Microlithographic Projection Exposure Apparatus
Application:
12/194,229 →
Publication:
US US20080304033A1
Projection Objective and Method for Optimizing a System Aperture Stop of a Projection Objective
Projection Objective and Method for Optimizing a System Aperture Stop of a Projection Objective
High-Na Projection Objective with Aspheric Lens Surfaces
Immersion Lithography Objective
Phase Delay Element and Method for Producing a Phase Delay Element
Application:
11/465,244 →
Publication:
US US20070039543A1
Replacement Device for an Optical Element
Lithographic apparatus and method
Application:
11/509,069 →
Publication:
US US20080073596A1
Method for Setting an Optical Imaging Property in a Microlithographic Projection Exposure Apparatus, and Projection Exposure Apparatus of This Type
Application:
12/044,743 →
Publication:
US US20080218716A1
Optical Element Unit
Optical Element Unit for Exposure Processes Having Sealing Element
Microlithographic projection exposure apparatus
Application:
12/031,595 →
Publication:
US US20080297754A1
Charged-Particle-Optical Systems, Methods and Components
Illumination System or Projection Lens of a Microlithographic Exposure System
Catoptric Objectives and Systems Using Catoptric Objectives
Catoptric Objectives and Systems Using Catoptric Objectives
Catoptric Objectives and Systems Using Catoptric Objectives
Apparatus for the detection of a surface reaction, especially for cleaning of an arbitrary two-dimensional surface or three-dimensional body
Application:
11/522,783 →
Publication:
US US20070143032A1
Microlithography Projection Objective Including Deformable Mirror with Adjusting Elements and Systems and Methods Using the Same
Device and Method for Influencing the Polarization Distribution in an Optical System
Illumination System Including an Optical Filter
Application:
12/058,173 →
Publication:
US US20090040495A1
Lithographic Apparatus and Method of Controlling
Application:
12/061,339 →
Publication:
US US20080284998A1
Lithographic Apparatus, and Device Manufacturing Method
Lithographic Apparatus, and Device Manufacturing Method
Cleaning Method, Apparatus and Cleaning System
Microlithographic Projection Exposure Apparatus
Lithographic Apparatus and Device Manufacturing Method
Microlithographic Projection Exposure Apparatus and Method for Producing Microstructured Components
Application:
12/054,991 →
Publication:
US US20080204692A1
Euv Illumination System with a System for Measuring Fluctuations of the Light Source
Method of Processing an Optical Element and an Optical Element, in Particular for a Microlithographic Projection Exposure Apparatus
Optical Device with Raster Elements, and Illumination System with the Optical Device
Projection Illumination System
Projection Objective for Semiconductor Lithography
Particle-Optical Component
Application:
12/095,198 →
Publication:
US US20090159810A1
Microlithographic Exposure Apparatus
Devices and Methods for Inspecting Optical Elements with a View to Contamination
Projection Objective of a Microlithographic Projection Exposure Apparatus
Electronic Device That Includes Ranked Control Units That Are Connected Together and Control Method Thereof
Microlithography Optical System
Optical Imaging Device with Determination of Imaging Errors
Illumination System Particularly for Microlithography
Illumination System Particularly for Microlithography
Illumination System Particularly for Microlithography
Illumination System Particularly for Microlithography
Refractive Projection Objective for Immersion Lithography
Microlithography Projection Optical System, Tool and Method of Production
Microlithography Projection Optical System and Method for Manufacturing a Device
Application:
12/702,040 →
Publication:
US US20100134907A1
Groupwise Corrected Objective
Projection System for Euv Lithograhphy
Projection Exposure Apparatus
Method for Approximating an Influence of an Optical System on the State of Polarization of Optical Radiation
Illumination System of a Microlithographic Projection Exposure Apparatus
Illumination System for a Microlithographic Projection Exposure Apparatus
Optical Integrator for an Illumination System of a Microlithographic Projection Exposure Apparatus
Microlithographic Illumination System
Projection Exposure Methods and Systems
Catadioptric Projection Objective with Pupil Correction
Application:
12/511,515 →
Publication:
US US20100020390A1
Off-Axis Objectives with Rotatable Optical Element
Optical System of an Illumination Device of a Projection Exposure Apparatus
Illuminator for a Lithographic Apparatus and Method
Reflective Projection Lens for Euv-Photolithography
Projection Objective and Projection Exposure Apparatus with Negative Back Focus of the Entry Pupil
Projection Objective and Projection Exposure Apparatus with Negative Back Focus of the Entry Pupil
Reduction Projection Objective and Projection Exposure Apparatus Including the Same
Projection Objective and Projection Exposure Apparatus Including the Same
Projection Objective and Projection Exposure Apparatus Including the Same
Support structure for temporarily supporting a substrate
Application:
11/728,799 →
Publication:
US US20070285647A1
Support for a Component of an Optical Device Including a Locking Device
Faceted Mirror Apparatus
Illumination System with Zoom Objective
Holding Device for Optical Element
Methods of Testing and Manufacturing Optical Elements
Facet mirror comprising a multiplicity of mirror segments
Application:
11/789,072 →
Publication:
US US20080266686A1
Projection Exposure System and Use Thereof
Polarization-Modulating Optical Element and Method for Manufacturing Thereof
Illumination System for Euv Lithography
Application:
12/235,277 →
Publication:
US US20090041182A1
High-Na Projection Objective
Symmetrical Objective Having Four Lens Groups for Microlithography
Optical Imaging Device with Thermal Attenuation
Projection Exposure Apparatus, Projection Exposure Method and Projection Objective
Method for Manufacturing a Lens of Synthetic Quartz Glass with Increased H2 Content
Method for Correcting Optical Proximity Effects
An optical imaging device and optical imaging method with adjustment device for reducing dynamic fluctuations in the pressue difference
Application:
11/804,632 →
Publication:
US US20080013063A1
Euv Illumination System
Euv Illumination System
Catadioptric Projection System for 157NM Lithography
Objectives as a Microlithography Projection Objective with at Least One Liquid Lens
Catoptric Illumination System for Microlithography Tool
Method of Optimizing Imaging Performance
Projection Objective of a Microlithographic Projection Exposure Apparatus
Lithographic Projection Objective
Collector Configured of Mirror Shells
Illumination System of a Microlithographic Projection Exposure Apparatus
Application:
12/272,297 →
Publication:
US US20090115991A1
Lens Blank and Lens Elements as Well as Method for Their Production
Lens Blank and Lens Elements as Well as Method for Their Production
Microlithographic Projection Exposure Apparatus Illumination Optics
Optical Apparatus and Method for Modifying the Imaging Behavior of Such Apparatus
Illumination System for a Microlithography Projection Exposure Apparatus
Collector for an Illumination System
Support for an Optical Element
Application:
12/358,722 →
Publication:
US US20090185148A1
Method and Apparatus for Determining a Deviation of an Actual Shape from a Desired Shape of an Optical Surface
Microlithographic Projection Exposure Apparatus
Composite Structure for Microlithography and Optical Arrangement
Method of Structuring a Photosensitive Material
Catadioptric Projection Objective with Pupil Mirror, Projection Exposure Apparatus and Projection Exposure Method
Projection Objective of a Microlithographic Projection Exposure Apparatus
Optical System for Semiconductor Lithography
Optical System for Semiconductor Lithography
Application:
12/337,262 →
Publication:
US US20090135395A1
Holding Device for an Optical Element with Support Force Equalization
Projection Objective Having Mirror Elements with Reflective Coatings
Arrangement of Two Connected Bodies
Application:
11/842,313 →
Publication:
US US20080100815A1
Actuator Device
Optical Element Module with Minimized Parasitic Loads
Projection Exposure Apparatus and Optical System
Method and System for Correcting Image Changes
Replacement Apparatus for an Optical Element
Replacement Apparatus for an Optical Element
Replacement Apparatus for an Optical Element
Illumination System Having a Beam Deflection Array for Illuminating a Mask in a Microlithographic Projection Exposure Apparatus
Subsystem of an Illumination System of a Microlithographic Projection Exposure Apparatus
Chromatically Corrected Catadioptric Objective and Projection Exposure Apparatus Including the Same
Chromatically Corrected Catadioptric Objective and Projection Exposure Apparatus Including the Same
Particle-Optical Systems and Arrangements and Particle-Optical Components for Such Systems and Arrangements
Optical Arrangement for Immersion Lithography with a Hydrophobic Coating, as Well as Projection Exposure Apparatus Comprising the Same
Optical Arrangement and Euv Lithography Device with at Least One Heated Optical Element, Operating Methods, and Methods for Cleaning as Well as for Providing an Optical Element
Optical element unit and method of supporting an optical element
Optical Module with Minimized Overrun of the Optical Element
Optical System for Radiation in the Euv-Wavelength Range and Method for Measuring a Contamination Status of Euv-Reflective Elements
Optical Arrangement, in Particular Projection Exposure Apparatus for Euv Lithography, as Well as Reflective Optical Element with Reduced Contamination
Projection Exposure Method and Projection Exposure System Therefor
Illumination System for Microlithography
Method and a Device for Positioning an Element in an Optical System
Method for Improving the Imaging Properties of an Optical System, and Such an Optical System
Application:
12/409,277 →
Publication:
US US20090213352A1
Lens Made of a Crystalline Material
Method of Manufacturing an Optical Element
Illumination System of a Microlithographic Projection Exposure Apparatus
Unit Magnification Projection Objective
Method and Device for Connecting an Optical Element to a Frame
Method and Device for Replacing Objective Parts
Application:
12/430,633 →
Publication:
US US20090260654A1
Projection System for Euv Lithography
Patent:
42,118 →
Application:
11/981,511 →
Illumination system particularly for microlithography
Application:
11/981,510 →
Illumination System Particularly for Microlithography
Patent:
42,065 →
Application:
11/981,032 →
Illumination System Particularly for Microlithography
Patent:
41,667 →
Application:
11/981,033 →
Mirror with a Mirror Carrier and Projection Exposure Apparatus
Optical Devices Having Kinemtaic Components
Application:
11/935,719 →
Publication:
US US20080117397A1
Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
Imaging Device in a Projection Exposure Machine
Imaging Device in a Projection Exposure Facility
Method and Apparatus for Interferometrically Measuring the Shape of a Test Object
Optical imaging device and method for reducing dynamic fluctuations in pressure difference
Method and Apparatus for Determining at Least One Optical Property of an Imaging Optical System
Illumination Optics for Projection Microlithography and Related Methods
Application:
12/464,730 →
Publication:
US US20090262324A1
Method for Removing Contamination on Optical Surfaces and Optical Arrangement
Illuminating Optical Unit and Projection Exposure Apparatus for Microlithography
Application:
12/473,137 →
Publication:
US US20090251677A1
Method of Manufacturing a Projection Objective and Projection Objective
Optical System with an Exchangeable, Manipulable Correction Arrangement for Reducing Image Aberrations
Illumination Optics for Projection Microlithography
Projection Objectives Having Mirror Elements with Reflective Coatings
Microlithograph System
Method and a Device for Processing Birefringent and/or Optically Active Materials and Phase Plate
Application:
11/950,153 →
Publication:
US US20080151245A1
Irradiation with High Energy Ions for Surface Structuring and Treatment of Surface Proximal Sections of Optical Elements
Illumination System or Projection Objective of a Microlithographic Projection Exposure Apparatus
Microlithography Illumination Systems, Components and Methods
Optical Element and Illumination Optics for Microlithography
Transmitting Optical Element with Low Foreign-Element Contamination
Catadioptric Projection Objective with Tilted Deflecting Mirrors, Projection Exposure Apparatus, Projection Exposure Method, and Mirror
Projection Optics for Microlithography
Microlithographic Projection Exposure Apparatus
Imaging Optical System
Projection Objective for Lithography
Projection Objective for Lithography
Projection Exposure Tool for Microlithography with a Measuring Apparatus and Method for Measuring an Irradiation Strength Distribution
Optical System and Method of Use
Illumination System of a Microlithographic Projection Exposure Apparatus
Reflective Optical Element for Euv Lithography Device
Method and Device for Monitoring Multiple Mirror Arrays in an Illumination System of a Microlithographic Projection Exposure Apparatus
Method of Producing a Diffractive Optical Element and Diffractive Optical Element Produced by Such a Method
Method for Producing Facet Mirrors and Projection Exposure Apparatus
Application:
12/504,844 →
Publication:
US US20100007866A1
Optical Element with Multiple Primary Light Sources
Imaging Device with Exchangeable Diaphragms and Method Therefor
Application:
12/549,541 →
Publication:
US US20100066990A1
Continuous Coating Installation, Methods for Producing Crystalline Solar Cells, and Solar Cell
Application:
12/538,998 →
Publication:
US US20100024865A1
Apparatus and Method for Measuring the Outgassing and Euv Lithography Apparatus
Application:
12/552,483 →
Publication:
US US20100112494A1
Method for Cleaning an Euv Lithography Device, Method for Measuring the Residual Gas Atmosphere and the Contamination and Euv Lithography Device
Projection Objective of a Microlithographic Projection Exposure Apparatus
Application:
12/539,136 →
Publication:
US US20100026978A1
Imaging System, in Particular a Projection Objective of a Microlithographic Projection Exposure Apparatus
Adjusting Device with a Laser Light Source and a Reflector for Aligning a Microlithography Projection Exposure Installation
Method for Improving Imaging Properties of an Optical System, and Such an Optical System
Application:
12/552,894 →
Publication:
US US20100014065A1
Method and Apparatus for Producing an Element Having at Least One Freeform Surface Including a Smoothing Step Performed While the Surface Is Under Elastic Stress
Application:
12/563,766 →
Publication:
US US20100033696A1
Correction of Optical Elements by Correction Light Irradiated in a Flat Manner
Six Degree of Freedom (Dof) Actuator Reaction Mass
Illumination System of a Microlithographic Projection Exposure Apparatus
Optical System of a Microlithographic Projection Exposure Apparatus
Method for Adjusting a Projection Objective
Optical Aperture Device
Projection Exposure Apparatus for Microlithography
Application:
12/103,185 →
Publication:
US US20080259303A1
Projection Objective for Microlithography
Application:
12/104,091 →
Publication:
US US20080259308A1
Illumination System for Illuminating a Mask in a Microlithographic Exposure Apparatus
Optical Correction Device
Projection Objective and Projection Exposure Apparatus for Microlithography
Application:
12/609,437 →
Publication:
US US20100085644A1
Methods for Producing an Antireflection Surface on an Optical Element, Optical Element and Associated Optical Arrangement
Application:
12/631,536 →
Publication:
US US20100149510A1
Projection Objective for Microlithography
Application:
12/624,755 →
Publication:
US US20100079741A1
Projection Objective for Microlithography with Stray Light Compensation and Related Methods
Method for Producing an Optical Element Through a Molding Process Using a Separation Layer System
Application:
12/626,437 →
Publication:
US US20100182710A1
Projection Objective and Projection Exposure Apparatus for Microlithography
Optical Element, Projection Lens and Associated Projection Exposure Apparatus
Projection Exposure System for Microlithography
Application:
12/623,744 →
Publication:
US US20100134768A1
Chromatically Corrected Objective and Projection Exposure Apparatus Including the Same
Application:
12/143,598 →
Publication:
US US20090316256A1
Chromatically Corrected Objective with Specifically Structured and Arranged Dioptric Optical Elements and Projection Exposure Apparatus Including the Same
Optical Assembly, Projection Exposure Apparatus and Projection Objective
Microlithographic Projection Exposure Apparatus
Microlithographic Projection Exposure Apparatus
Method and Device for Controlling a Plurality of Actuators and an Illumination Device for Lithography
Detector for Registering a Light Intensity, and Illumination System Equipped with the Detector
Application:
12/169,466 →
Publication:
US US20090015814A1
Method of Measuring a Deviation of an Optical Surface from a Target Shape
Optical Element and Method of Calibrating a Measuring Apparatus Comprising a Wave Shaping Structure
Projection Objective
Application:
12/687,325 →
Publication:
US US20100134880A1
Illumination System and Microlithographic Projection Exposure Apparatus Including Same
Combination Stop for Catoptric Projection Arrangement
Projection Objective
Method for Examining a Wafer with Regard to a Contamination Limit and Euv Projection Exposure System
Interference Systems for Microlithgraphic Projection Exposure Systems
Projection Objective for Microlithography, Projection Exposure Apparatus, Projection Exposure Method and Optical Correction Plate
Illumination System of a Microlithographic Projection Exposure Apparatus
Method and Apparatus for Measuring Scattered Light on an Optical System
Lithographic Apparatus and Device Manufacturing Method
Euv Lithography Apparatus and Method for Determining the Contamination Status of an Euv-Reflective Optical Surface
Force Actuator
Charged Particle Inspection Method and Charged Particle System
Application:
11/991,547 →
Publication:
US US20090256075A1
Illumination System of a Microlithographic Projection Exposure Apparatus with a Birefringent Element
Imaging Microoptics for Measuring the Position of an Aerial Image
Microlithographic Projection Exposure Apparatus
Bundle-Guiding Optical Collector for Collecting the Emission of a Radiation Source
Projection Objective for Micrlolithography Having a Tube and an Optical Surface with a Through Hole
Application:
12/723,456 →
Publication:
US US20100208225A1
Illumination Optical System for Microlithography
Method and System for Removing Contaminants from a Surface
Application:
12/234,447 →
Publication:
US US20100071720A1
Calibration of a Position Measuring Device of an Optical Device
Optical Unit Having Adjustable Force Action on an Optical Module
Application:
12/730,395 →
Publication:
US US20110019171A1
Projection Objective for Microlithography
Method and System for Measuring a Surface of an Object
Microlithographic Projection Exposure Apparatus with Correction Optical System That Heats Projection Objective Element
Projection Objective for Microlithography
Optical Element with at Least One Electrically Conductive Region, and Illumination System with the Optical Element
Imaging Optical System and Projection Exposure System for Microlithography
Imaging Optical System and Related Installation and Method
Device for Controlling Temperature of an Optical Element
Imaging Optical System and Projection Exposure System Including the Same
Catoptric Imaging Optical System with an Arc-Shaped Object Field
Optical Element for Reflection of Uv Radiation, Method for Manufacturing the Same and Projection Exposure Apparatus Comprising the Same
Illumination System of a Microlithographic Projection Exposure Apparatus
Optical System and Method for Characterising an Optical System
Illumination System of a Microlithographic Projection Exposure Apparatus
Optical System
Cleaning Module and Euv Lithography Device with Cleaning Module
Application:
12/893,762 →
Publication:
US US20110058147A1
Illumination Optics for Microlithography
Illumination Optics and Projection Exposure Apparatus
Illumination System for Illuminating a Mask in a Microlithographic Exposure Apparatus
Projection Illumination System for Euv Microlithography
Microlithographic Projection Exposure Apparatus Having a Multi-Mirror Array with Temporal Stabilisation
Microlithographic Projection Exposure Apparatus
Illumination System for a Microlithographic Projection Exposure Apparatus
Method and Apparatus for Structuring a Radiation-Sensitive Material
Projection Exposure System for Microlithography with a Measurement Device
Repair Method for Optical Elements Having a Coating and Corresponding Optical Elements
Illumination System for a Microlithography Projection Exposure Apparatus
Application:
12/871,979 →
Publication:
US US20110001948A1
Cleaning Module, Euv Lithography Device and Method for the Cleaning Thereof
Facet Mirror for Use in a Projection Exposure Apparatus for Microlithography
Optical System for a Microlithographic Projection Exposure Apparatus and Microlithographic Exposure Method
Application:
12/851,074 →
Publication:
US US20110063597A1
Method for Operating an Illumination System of a Microlithographic Projection Exposure Apparatus
Optical Device with Stiff Housing
Application:
12/390,849 →
Publication:
US US20090219497A1
Projection Objective for Microlithography
Method and an Apparatus for Measuring a Deviation of an Optical Test Surface from a Target Shape
Patent:
8,269,981 →
Application:
12/414,390 →
Optimization and Matching of Optical Systems by Use of Orientation Zernike Polynomials
Lithographic Apparatus Comprising an Internal Sensor and a Mini-Reactor, and Method for Treating a Sensing Surface of the Internal Sensor
Particle-Optical Systems and Arrangements and Particle-Optical Components for Such Systems and Arrangements
Illumination System for Illuminating a Mask in a Microlithographic Projection Exposure Apparatus
Removing Reflective Layers from Euv Mirrors
Illumination Optics for a Microlithographic Projection Exposure Apparatus
Illumination Optics for a Microlithographic Projection Exposure Apparatus
Application:
12/836,982 →
Publication:
US US20100277707A1
Connecting Arrangement for an Optical Device
Catadioptric Projection Objective
Optical Imaging Device and Imaging Method for Microscopy
Optical imaging device and imaging method for microscopy
Optical Measurement Apparatus for a Projection Exposure System
Application:
12/569,430 →
Publication:
US US20100079738A1
High Transmission, High Aperture Catadioptric Projection Objective and Projection Exposure Apparatus
Method for the Spatially Resolved Measurement of Birefringence, and a Measuring Apparatus
Application:
12/604,670 →
Publication:
US US20100103420A1
Optical Arrangement for Three-Dimensionally Patterning a Material Layer
Application:
12/607,612 →
Publication:
US US20100112465A1
Illumination Device of a Microlithographic Projection Exposure Apparatus, and Microlithographic Projection Exposure Method
Application:
12/637,889 →
Publication:
US US20100149504A1
Illumination Device of a Microlithographic Projection Exposure Apparatus, and Microlithographic Projection Exposure Method
Projection Exposure Method and Projection Exposure Apparatus for Microlithography
Illumination System of a Microlothographic Projection Exposure Apparatus
Illumination System of a Microlothographic Projection Exposure Apparatus
Optical system, in particular a microlithography projection exposure plant
Application:
61/297,923 →
Projection Exposure Method, System and Objective
Polarisationsbeeinflussende Optische Anordnung, Sowie Optisches System Einer Mikrolithographischen Projektionsbelichtungsanlage
Application:
61/302,249 →
Optisches System Mit Blendeneinrichtung
Application:
61/302,734 →
Optical Raster Element, Optical Integrator and Illumination System of a Microlithographic Projection
Application:
61/302,599 →
Method for Arranging an Optical Module in a Measuring Apparatus and a Measuring Apparatus
Mirror for Guiding a Radiation Bundle
Projection Exposure Apparatus for Semiconductor Lithography Comprising a Cooling Device
Application:
12/711,993 →
Publication:
US US20100220302A1
Lithographic Apparatus and Illumination System
Application:
61/316,114 →
Optical Membrane Element Having a Longitudinally Adjustable Connecting Element
Catadioptric Projection Objective
Mirror for the Euv Wavelength Range, Projection Objective for Microlithography Comprising Such a Mirror, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Objective
Illumination System and Lithographic Apparatus
Application:
61/329,371 →
Reflektives Optisches Element, Projektionssystem Und Projektionsbelichtungsanlage
Application:
61/332,288 →
Beleuchtungsoptik F¿R Die Projektionslithografie
Application:
61/332,295 →
Optical element
Application:
12/817,915 →
Publication:
US US20100321649A1
Optical Element for Uv or Euv Lithography
Application:
61/375,069 →
Euv-Kollektor
Application:
61/378,413 →
Method For Determining The Registration Of A Structure On A Photomask And Apparatus To Perform The Method
Application:
61/381,700 →
Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
Application:
61/386,168 →
Method for Joining Bodies and Bound Body
Application:
61/387,570 →
Projection Objective
Related Assignments
(24)
Other recorded transfers of the patents in this record — the chain of ownership.
Record to Correct Assignee's Name on a Document Previously Recorded at Reel 011988, Frame 0460. Assignor Hereby Confirms the Assignment of the Entire Interest to Said Assignee.
Oct 9, 2001
From: SCHUSTER, KARL-HEINZ; SINGER, WOLFGANG
To: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
Reel/Frame 012239/0726 →
Assignment of Assignor's Interest
Oct 16, 2001
From: OSTERRIED, KARLFRID DR.
To: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
Reel/Frame 012267/0634 →
Assignment of Assignor's Interest
Dec 17, 2001
From: MANN, HANS-JURGEN; DINGER, UDO; MUHLBEYER, MICHAEL
To: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
Reel/Frame 012375/0612 →
Assignment of Assignor's Interest
Jun 13, 2003
From: HOLLER, FRANK; ROSS-MESSEMER, MARTIN; MENCK, ALEXANDER
To: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
Reel/Frame 014164/0956 →
Change of Name
Jun 29, 2004
From: CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AKTIENGESELLSCHAFT
To: CARL ZEISS SMT AG
Reel/Frame 015530/0437 →
Assignment of Assignor's Interest
Jul 1, 2004
From: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 015521/0783 →
Assignment of Assignor's Interest
Jul 6, 2004
From: SINGER, WOLFGANG; SCHUSTER, KARL-HEINZ
To: CARL ZEISS SMT AG
Reel/Frame 015539/0278 →
Assignment of Assignor's Interest
Jul 12, 2004
From: CARL ZEISS STIFTUNG
To: CARL ZEISS SMT AG
Reel/Frame 015541/0879 →
Assignment of Assignor's Interest
Jul 12, 2004
From: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 015541/0896 →
Assignment of Assignor's Interest
Jul 12, 2004
From: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 015551/0027 →
Assignment of Assignor's Interest
Jul 13, 2004
From: CARL-ZEISS-STIFTUNG (TRADING AS CARL ZEISS)
To: CARL ZEISS SMT AG
Reel/Frame 014845/0178 →
Confirmatory Assignment
Jul 21, 2004
From: CARL-ZEISS-STIFTUNG, TRADING AS CARL ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 014888/0198 →
Address Change for Assignee
Aug 9, 2004
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT AG
Reel/Frame 016309/0107 →
Assignment of Assignor's Interest
Aug 9, 2004
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT AG
Reel/Frame 016301/0556 →
Assignment of Assignor's Interest
Aug 30, 2004
From: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 015736/0296 →
Assignment of Assignor's Interest
Dec 13, 2004
From: CARL-ZEISS-STIFTUNG
To: CARL ZEISS SMT AG
Reel/Frame 016059/0726 →
Assignment of Assignor's Interest
Apr 1, 2005
From: GOEHNERMEIER, AKSEL; PAZIDIS, ALEXANDRA; KEURZ, BIRGIT; ZACZEK, CHRISTOPH
To: CARL ZEISS SMT AG
Reel/Frame 015994/0310 →
Assignment of Assignor's Interest
Mar 20, 2006
From: CARL-ZEISS-STIFTUNG TRADING AS CART ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 017696/0272 →
Assignment of Assignor's Interest
May 16, 2006
From: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 017626/0873 →
Corrected Cover Sheet to Correct Assignor Name, Previously Recorded at Reel/Frame 017696/0272 (Assignment of Assignor's Interest)
Jun 22, 2006
From: CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
To: CARL ZEISS SMT AG
Reel/Frame 017833/0334 →
Assignment of Assignor's Interest
Jul 16, 2007
From: FIOLKA, DAMIAN; SCHOLZ, AXEL
To: CARL ZEISS SMT AG
Reel/Frame 019600/0424 →
Assignment of Assignor's Interest
May 13, 2009
From: FREISCHLAD, KLAUS
To: CARL ZEISS SMT AG
Reel/Frame 022679/0441 →
Assignment of Assignor's Interest
May 13, 2009
From: FREISCHLAD, KLAUS
To: CARL ZEISS SMT AG
Reel/Frame 022679/0408 →
Assignment of Assignor's Interest
Jul 9, 2012
From: BERTELE, ANDREAS; VOGT, PETER
To: CARL ZEISS SMT GMBH
Reel/Frame 028509/0672 →