Device and method for range-resolved determination of scattered light, and an illumination mask

1. An illumination mask for a device for determination of scattered light scattered from illuminating radiation defining a beam path, the illumination mask comprising:

a scattered light measurement structure,

wherein the scattered light measurement structure has a scattered light marker zone transparent to the illuminating radiation, and

wherein the scattered light marker zone has a rotationally non-symmetric, annular segment shape bounded by a dark field zone that is non-transparent to the illuminating radiation.

2. The illumination mask of claim 1 , wherein the scattered light measurement structure further comprises a surface element consisting essentially of a dark field zone.

3. The illumination mask of claim 1 , wherein the dark field zone located in a central portion of the scattered light measurement structure.

4. The illumination mask of claim 1 , wherein the illumination mask creates an illumination pattern when illuminated with extreme ultraviolet light.

5. The illumination mask of claim 1 , wherein a plurality of scattered light measurement structures are arranged in a regular array on the illumination mask.

6. The illumination mask of claim 1 , wherein the determination of scattered light is a range-resolved determination of scattered light.

7. A scattered light measurement device, comprising:

an illumination mask providing measuring radiation on an entrance side of a test component consisting at least essentially of a projection objective, and

a detection part for detection of the measuring radiation scattered by the test component and disposed on an exit side of the test component,

wherein the illumination mask comprises at least one scattered light measurement structure,

wherein the scattered light measurement structure has a scattered light marker zone transparent to illuminating radiation including the measuring radiation; and

wherein the scattered light marker zone has a rotationally non-symmetric, annular segment shape bounded by a dark field zone that is non-transparent to the illuminating radiation.

8. The scattered light measurement device of claim 7 , wherein the detection of light is a range-resolved detection of scattered light.

9. The scattered light measurement device of claim 7 , wherein the scattered light measurement structure further comprises a surface element that consists essentially of a dark field zone.

10. The scattered light measurement device of claim 7 , wherein the dark field zone is located in a central portion of the scattered light measurement structure.

11. The scattered light measurement device of claim 7 , wherein a plurality of scattered light measurement structures are arranged in a regular array on the illumination mask.

12. A method of using the scattered light measurement device of claim 11 , wherein the test component is irradiated sequentially with the measuring radiation passing through the plurality of scattered light measurement structures, and the detection part detects the scattered measuring radiation sequentially as the test component is irradiated with the measuring radiation passing through each scattered light measurement structure.

13. The scattered light measurement device of claim 7 , wherein the illumination mask creates an illumination pattern when illuminated with extreme ultraviolet light.

14. A method of detecting scattered light, the method comprising:

disposing a mask comprising a scattered light measurement structure with a scattered light marker zone transparent to illuminating radiation and having a rotationally non-symmetric, annular segment shape bounded by a dark field zone that is non-transparent to the illuminating radiation;

illuminating the mask with the illuminating radiation;

disposing a detection apparatus for detecting the illuminating radiation scattered by a projection objective;

disposing the projection objective optically between the mask and the detection apparatus; and

detecting the illuminating radiation scattered by the projection objective with the detection apparatus.

15. The method of claim 14 , wherein the mask is illuminated with extreme ultraviolet light.

16. The method of claim 14 , wherein the dark field zone is located in a central portion of the scattered light measurement structure.

17. The method of claim 14 , wherein the mask comprises a plurality of scattered light measurement structures arranged on the mask, and

wherein the scattered light measurement structures are used sequentially to measure scattered light behavior.

18. A micro-lithographic projection exposure apparatus comprising:

a projection objective; and

a scattered light measurement device for performing scattered light measurement of the projection objective,

wherein the scattered light measurement device comprises:

an illumination mask comprising at least one scattered light measurement structure wherein the scattered light measurement structure comprises a scattered light marker zone transparent to light; and

a detection apparatus for detecting the light scattered by and emitted from the projection objective,

wherein the scattered light marker zone has a rotationally non-symmetric, annular segment shape bounded by a dark field zone that is non-transparent to the light.

19. The apparatus of claim 18 , wherein the dark field zone covers a central portion of the scattered light measuring structure.

20. The apparatus of claim 18 , further comprising an illumination source that provides the light, which comprises extreme ultraviolet light.

21. The apparatus of claim 18 , wherein a plurality of the scattered light measurement structures are arranged in a regular array on the illumination mask.

22. A method for operating a device for determining scattered light from a projection objective, the device comprising:

an illumination mask, comprising at least one scattered light measurement structure having a scattered light marker zone, which is transparent to radiation, with a rotationally non-symmetric, annular segment shape bounded by a dark field zone that is non-transparent to the radiation, for providing measuring radiation on an entrance side of the projection objective, and

a detection part for detecting the radiation scattered by the projection objective and exiting on an exit side of the projection objective,

wherein the method comprises:

irradiating the projection objective with the measuring radiation;

detecting the exiting radiation; and

determining the scattered light from the detected radiation.

23. The method of claim 22 , wherein the dark field zone located in a central portion of the scattered light measurement structure.

24. The method of claim 22 , wherein the scattered light determination is a range-resolved determination of the scattered light.

25. The method of claim 22 , wherein the radiation comprises extreme ultraviolet light.

26. A method of detecting scattered light in an optical system, the method comprising:

using scattered light marker zones to detect the scattered light;

wherein the scattered light marker zones are transparent to illuminating radiation and have rotationally non-symmetric shapes forming annular segments and are bounded by respective dark field zones that are non-transparent to the illuminating radiation; and

wherein the scattered light is detected in the annular segments.