Optical imaging device

1. A projection objective for microlithography, having at least one optical element which is provided with an outer frame, an inner ring in which the optical element is mounted, and a manipulator instrument having at least one actuator, wherein contactless linkage of the inner ring to the outer frame is provided in at least one degree of freedom by means of a support arranged between the inner ring and the outer frame, the manipulator instrument having at least one actuator, the setting forces and/or bearing forces of which act contactlessly on the inner ring, for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame to reduce parasitic effects, said at least one degree of freedom including at least one degree of freedom other than rotation about an optical axis of the projection objective, the support comprising a fluid bearing, the fluid bearing comprising a gas bearing, the gas bearing having at least one gas feed line and at least one gas discharge line.

2. The projection objective as claimed in claim 1 , wherein air is provided as the gas for the gas bearing.

3. The projection objective as claimed in claim 1 , wherein the at least one actuator comprises an electromagnet and/or a permanent magnet and/or a force-controlled actuator, for example a Lorentz actuator, which is mounted in the outer frame and/or in the inner ring.

4. The projection objective as claimed in claim 1 , wherein at least two actuators are designed as air nozzles, the air exit openings of which are directed toward the inner ring.

5. A projection objective for microlithography, comprising:

(a) at least one optical element which is provided with an outer frame;

(b) an inner ring in which the optical element is mounted;

(c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and

(d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, said support comprising a fluid bearing, said fluid bearing comprising a gas bearing having at least one gas feed line and at least one gas discharge line,

the inner ring being provided with at least two annular recesses, which are fitted on a side of the inner ring next to the outer frame and which are connected to the at least one gas feed line and the at least one gas discharge line arranged in the outer frame.

6. The projection objective as claimed in claim 5 , wherein an annular recess, which is connected to the at least one gas feed line, is surrounded by two recesses arranged at a distance from it, which lie radially inward and radially outward from the annular recess and which are respectively connected to a gas discharge line.

7. A projection objective for microlithography, comprising:

(a) at least one optical element which is provided with an outer frame;

(b) an inner ring in which the optical element is mounted;

(c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and

(d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, and

at least two sensors for determining the position of the inner ring in the radial direction relative to the outer frame.

8. The projection objective as claimed in claim 1 , wherein at least one sensor is provided for determining the position of the inner ring in the axial direction (z position) relative to the outer frame.

9. A projection objective for microlithography, comprising:

(a) at least one optical element which is provided with an outer frame;

(b) an inner ring in which the optical element is mounted;

(c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and

(d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, the outer frame being provided with mechanical end stops for limiting the path of the inner ring.

10. A projection objective for microlithography, comprising:

(a) at least one optical element which is provided with an outer frame;

(b) an inner ring in which the optical element is mounted;

(c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and

(d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, the support comprising at least two support segments arranged on a circumferential region between the inner ring and the outer frame.

11. A projection objective for microlithography, comprising:

(a) at least one optical element which is provided with an outer frame;

(b) an inner ring in which the optical element is mounted;

(c) a manipulator instrument having at least one actuator, setting forces and/or bearing forces of the actuator acting contactlessly on the inner ring for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame, and

(d) a support arranged between the inner ring and the outer frame, a contactless linkage of the inner ring to the outer frame being provided, in at least one degree of freedom, by means of the support, wherein the at least one actuator comprises three actuators which are mounted at a spacing of respectively 120° in the outer frame.

12. The projection objective as claimed in claim 11 , wherein three sensors are provided for determining the position of the inner ring relative to the outer frame, which are respectively arranged at a spacing of respectively 120° opposite the actuators.

13. The projection objective as claimed in claim 7 , wherein the sensors are designed as optical path length measurement systems.

14. The projection objective as claimed in claim 8 , wherein the sensors are designed as optical path length measurement systems.

15. The projection objective as claimed in claim 12 , wherein the sensors are designed as optical path length measurement systems.

16. A projection objective for microlithography, having at least one optical element which is provided with an outer frame, an inner ring in which the optical element is mounted, and a manipulator instrument having at least one actuator, wherein contactless linkage of the inner ring to the outer frame is provided in at least one degree of freedom by means of a support arranged between the inner ring and the outer frame, the manipulator instrument having at least one actuator, the seffing forces and/or bearing forces of which act contactlessly on the inner ring, for mounting and/or positioning and/or manipulating the inner ring relative to the outer frame to reduce parasitic effects, said at least one degree of freedom including at least one degree of freedom other than rotation about an optical axis of the projection objective, wherein a least two actuators are designed as air nozzles, the air exit openings of which are directed toward the inner ring.

17. The projection objective as claimed in claim 16 , wherein the support comprises a magnetic and/or electromagnetic bearing.

18. The projection objective as claimed in claim 16 , wherein the support comprises a fluid bearing.

19. The projection objective as claimed in claim 18 , wherein the fluid bearing comprises a gas bearing.

20. The projection objective as claimed in claim 19 , wherein air is provided as the gas for the gas bearing.