Illumination system with a plurality of light sources

1. An illumination system for EUV-wavelengths, comprising:

a plurality of primary EUV-light sources from which a plurality of light paths originates; and

an optical unit, situated in said plurality of light paths, that combines light from said plurality of EUV-light sources.

2. The illumination system of claim 1 , wherein said optical unit comprises a reflective element.

3. The illumination system of claim 1 , wherein each of said plurality of EUV-light sources has a collector mirror assigned thereto.

4. The illumination system of claim 1 , wherein said optical unit combines light from more than two of said plurality of EUV-light sources.

5. The illumination system of claim 1 , wherein said optical unit combines light from three of said plurality of EUV-light sources.

6. The illumination system of claim 1 , wherein said optical unit combines light from four of said plurality of EUV-light sources.

7. The illumination system of claim 1 , wherein said optical unit combines light from five of said plurality of EUV-light sources.

8. The illumination system of claim 1 , wherein said optical unit combines light from six of said plurality of EUV-light sources.

9. The illumination system of claim 1 , wherein said plurality of EUV-light sources includes a laser plasma source.

10. The illumination system of claim 1 , wherein said plurality of EUV-light sources includes a pinch plasma source.

11. The illumination system of claim 1 , wherein said plurality of EUV-light sources includes a synchrotron radiation source.

12. The illumination system of claim 1 ,

wherein each of said plurality of EUV-light sources has a Lagrange optical invariant, and

wherein said optical unit combines said light from said plurality of EUV-light sources so that a total Lagrange optical invariant is achieved.

13. The illumination system of claim 1 ,

wherein each of said plurality of EUV-light sources has a Lagrange optical invariant, and

wherein a maximum number of said plurality of EUV-light sources coupled by said optical unit is determined by the condition:

Σ LC i ≦LC ill

all sources

with Lc i =Lagrange optical invariant of an i th member of said plurality of EUV-light sources,

and LC ill =Lagrange optical invariant of said illumination system.

14. An EUV-projection exposure system comprising:

said illumination system of claim 1 ;

a plane illuminated by said illumination system for accommodating a mask;

a projection objective lens; and

a carrier system for accommodating a light-sensitive object, wherein an image of said mask is formed on said light-sensitive object.

15. An EUV-projection exposure system of claim 14 , wherein said optical unit combines said light from said plurality of EUV-light sources so that a pupil of said projection objective lens is illuminated up to a predetermined degree of filing.

16. A method for production of microelectronic components, comprising using said EUV-projection exposure system of claim 15 .

17. An illumination system for wavelengths ≦193 nm, comprising:

a plurality of primary light sources; and

an optical unit that combines light from said plurality of primary light sources so that an increase of intensity is achieved.

18. An illumination system having a first Lagrange optical invariant for wavelengths ≦193 nm, comprising:

a plurality of primary light sources, wherein each of said plurality of primary light sources has a second Lagrange optical invariant; and

an optical unit that combines light from said plurality of primary light sources so that a sum of said second Lagrange optical invariants is less than or equal to said first Lagrange optical invariant.

19. The illumination system of claim 18 , wherein a maximum number of said plurality of primary light sources providing light combined by said optical unit is determined by the condition:

Σ LC i ≦LC ill

all sources

with LC i =Lagrange optical invariant of an i th member of said plurality of primary light sources, and

LC ill =Lagrange optical invariant of said illumination system.

20. The illumination system of claim 18 ,

wherein said illumination system further comprises a first plurality of raster elements transforming said plurality of primary light sources into a plurality of secondary light sources, and

wherein said first plurality of raster elements is imaged into a plane to form a plurality of images.

21. The illumination system of claim 20 , wherein each of said first plurality of raster elements has a concave surface.

22. The illumination system of claim 20 ,

wherein each of said first plurality of raster elements has a planar surface,

wherein said illumination system further comprises a collector unit, and

wherein said first plurality of raster elements transforms said plurality of primary light sources into said plurality of secondary light sources.

23. The illumination system of claim 20 , wherein each of said first plurality of raster elements is arranged and oriented to superimpose said plurality of images in said plane to form an illuminated field.

24. The illumination system of claim 20 , further comprising a second plurality of raster elements.

25. The illumination system of claim 24 ,

wherein said second plurality of raster elements is located at said plurality of secondary light sources,

wherein each of said plurality of secondary light sources is located on one of said second plurality of raster elements, and

wherein each of said first plurality of raster elements and each of said second plurality of raster elements are arranged and oriented to superimpose said plurality of images in said plane to form an illuminated field.

26. The illumination system of claim 24 , wherein each of said second plurality of raster elements has a concave surface.

27. The illumination system of claim 24 , wherein each of said second plurality of raster elements has a planar surface.

28. The illumination system of claim 24 , further comprising an optical element and an exit pupil, wherein said optical element is situated in an optical light path between said plurality of secondary light sources and said plane, to image said plurality of secondary light sources into said exit pupil.

29. The illumination system of claim 18 , further comprising a collector unit.

30. The illumination system of claim 29 , wherein said collector unit comprises a plurality of collector elements assigned to each of said plurality of primary light sources.

31. The illumination system of claim 30 , wherein said plurality of collector elements includes a collector mirror.

32. A projection exposure system comprising:

said illumination system of claim 18 ;

a plane illuminated by said illumination system for accommodating a mask;

a projection objective lens; and

a carrier system for accommodating a light-sensitive object, wherein an image of said mask is formed on said light-sensitive object.

33. A method for production of microelectronic components, comprising of using said projection exposure system of claim 32 .

34. A projection exposure apparatus comprising:

an illumination system for wavelengths ≦193 nm, wherein said illumination system comprises a plurality of primary light sources and an optical unit;

a plane illuminated by said illumination system for accommodating a mask;

a projection objective lens, wherein said optical unit combines light from said plurality of primary light sources so that a pupil of said projection objective lens is illuminated up to a predetermined degree of filing; and

a carrier system for accommodating a light-sensitive object, wherein an image of said mask is formed on said light-sensitive object.

35. The projection exposure apparatus according to claim 34 , wherein said plurality of primary light sources are EUV-light sources.

36. The projection exposure apparatus according to claim 34 , wherein said optical unit comprises a reflective element.

37. A method for production of microelectronic components, comprising using said projection exposure apparatus of claim 34 .

38. An illumination system for EUV-wavelengths, comprising:

a plurality of EUV-light sources;

an optical unit that combines light from said plurality of EUV-light sources;

a plurality of raster elements, situated in a light path downstream of said optical unit, for producing secondary light sources,

wherein said plurality of raster elements is imaged into a field plane to form a plurality of images that are superimposed to form an illuminated field.

39. The illumination system of claim 38 ,

wherein each of said plurality of EUV-light sources has a Lagrange optical invariant, and

wherein a maximum number of said plurality of EUV-light sources coupled by said optical unit is determined by the condition:

Σ LC i ≦LC ill

 all sources

with LC i =Lagrange optical invariant of an i th member of said plurality of EUV-light sources,

and LC ill =Lagrange optical invariant of said illumination system.

40. An illumination system for wavelengths ≦193 nm, comprising:

a plurality of primary light sources, wherein each of said plurality of primary light sources has a Lagrange optical invariant; and

an optical unit that combines light from said plurality of primary light sources so that a total Lagrange optical invariant is achieved being less than or equal to a Lagrange optical invariant of said illumination system.

41. The illumination system of claim 40 , wherein said optical unit combines said light from said plurality of light sources so that a pupil of a projection objective lens is illuminated up to a predetermined degree of filing.

42. The illumination system of claim 40 , wherein said plurality of light sources comprises a source selected from the group consisting of a laser plasma source or a pinch plasma source.

43. The illumination system of claim 40 , further comprising:

a plane illuminated by said illumination system for accommodating a mask;

a projection objective lens; and

a carrier system for accommodating a light-sensitive object, wherein an image of said mask is formed on said light-sensitive object.