Projection objective for microlithography
The invention relates to a projection lens comprising a lens assembly that has at least one first narrowing of the group of light beams. A lens with a non-spherical surface is located in front of and/or behind the first narrowing.
1. A refractive microlithographic projection objective, having a lens arrangement comprising at least one lens with an aspheric lens surface, wherein all aspheric lens surfaces have a vertex radius (R) of at least 350 mm.
2. The projection objective for microlithography according to claim 1 , wherein the diameter of said lens having an aspheric surface is smaller than 90% of the maximum diameter of said lens arrangement.
3. A projection objective comprising:
a lens arrangement comprising at least two lenses having an aspheric surface, the lens arrangement having at least one waist between two lenses having an aspheric surface,
wherein said lens arrangement comprises lenses of at least two materials from a group consisting of quartz glass and fluorides.
4. The projection objective according to claim 3 , wherein said lens arrangement does not exceed a maximum lens diameter of between 250 mm and 280 mm.
5. The projection objective according to claim 3 , having an object side and an image side, wherein said lens arrangement has on said image side a numerical aperture of between 0.80 and 0.85.
6. The projection objective according to claim 3 , further comprising an aperture stop wherein at least a last two positive lenses before said aperture stop are comprised of CaF 2 .
7. A refractive microlithographic projection objective according to claim 3 , having a lens arrangement comprising at least one lens with an aspheric lens surface, wherein all aspheric lens surfaces have a vertex radius (R) of at least 350.
8. The projection objective for microlighography according to claim 3 , wherein the diameter of said lens having an aspheric surface is smaller than 90% of the maximum diameter of said lens arrangement.
9. A projection objective comprising:
a lens arrangement having at least one waist,
an aperture stop arrangement in said lens arrangement, at least one lens having an aspheric surface being arranged after said aperture stop arrangement in a direction of propagation of radiation, and
at least one lens comprising fluoride.
10. The projection objective according to claim 9 , wherein said lens arrangement does not exceed a maximum lens diameter of between 250 mm and 280 mm.
11. The projection objective according to claim 9 , having an objective side and an image side, wherein said lens arrangement has on said image side a numerical aperture of between 0.80 and 0.85.
12. The projection objective according to claim 9 , having an objective side and an image side, wherein said lens arrangement has on said image side a numerical aperture of between 0.80 and 0.85.
13. The projection objective according to claim 9 , further comprising an aperture stop wherein at least a last two positive lenses before said aperture stop are comprised of CaF 2 .
14. A refractive microlithographic projection objective according to claim 9 , having a lens arrangement comprising at least one lens with an aspheric lens surface, wherein all aspheric lens surfaces have a vertex radius (R) of at least 350 mm.
15. The projection objective for microlithography according to claim 9 , wherein the diameter of said lens having an aspheric surface is smaller than 90% of the maximum diameter of said lens arrangement.
16. A projection exposure device for microlithography, comprising an excimer laser light source emitting radiation of wavelength shorter than 250 nm, and a projection objective according to claim 9 .
17. A projection objective according to claim 9 , comprising:
a first lens group having positive power;
a second lens group having negative power;
a third lens group having positive power; and
a fourth lens group having negative power;
wherein a lens at the end of said second lens group has an aspheric surface.
18. A projection objective according to claim 9 , comprising:
a lens arrangement comprising at least two lenses having an aspheric surface, the lens arrangement having at least one waist between two lenses having an aspheric surface,
wherein said lens arrangement comprises lenses of at least two materials from a group consisting of quarts glass and fluorides.
19. The projection objective for microlithography according to claim 1 , wherein all aspheric lens surfaces have a vertex radius (R) of at most 1,000 mm.
20. The projection objective for microlithography according to claim 1 , wherein all aspheric lens surfaces have a vertex radius (R) of at least 1,000 mm.
21. The projection objective for microlithography according to claim 7 , wherein all aspheric lens surfaces have a vertex radius (R) of at most 1,000 mm.
22. The projection objective for microlithography according to claim 7 , wherein all aspheric lens surfaces have a vertex radius (R) of at least 1,000 mm.
23. The projection objective for microlithography according to claim 14 , wherein all aspheric lens surfaces have a vertex radius (R) a value of at most 1,000 mm.
24. The projection objective for microlithography according to claim 14 , wherein all aspheric lens surfaces have a vertex radius (R) of at least 1,000 mm.