Polarization-modulating optical element and method for manufacturing thereof
View Patent ↗The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization, the method comprising joining a first component and a second component, wherein a non-plane surface of the first component being provided with a defined height profile is joined with a plane surface of the second component, whereby a mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.
1. A method for manufacturing an optical system, the method comprising:
a) making polarization optical measurements of an optical subsystem to produce polarization optical measurement data; and
b) manufacturing, based on the polarization optical measurement data, a polarization-modulating optical element, the polarization-modulating optical element causing, for light passing through the polarization-modulating element and due to stress-induced birefringence of the polarization-modulating optical element, a distribution of retardation between orthogonal states of polarization, the method of manufacturing the polarization-modulating optical element comprising:
joining a non-plane surface of a first component with a plane surface of a second component to produce a mechanical stress that causes the stress-induced birefringence of the polarization-modulating optical element; and
c) inserting the polarization-modulating optical element into the beam path of the subsystem such that a disturbance of the distribution of polarization in the subsystem which has been determined in a) is at least partially compensated by the polarization-modulating optical element,
further comprising, prior to joining:
calculating a height profile of the first component in order to obtain a predefined distribution of retardation; and
forming the defined height profile on the first component.
2. The method according to claim 1 , wherein joining is performed by wringing.
3. The method according to claim 1 , wherein only one component of the first and second component is deformed during joining.
4. The method according to claim 1 , wherein the mechanical stress is produced in only one component of the first and second component.
5. The method according to claim 1 , wherein one component of the first and the second component has an average thickness being at least a tenfold.
6. The method according to claim 1 , wherein one component of the first and second component is a plano-convex lens or a plano-concave lens.
7. The method according to claim 1 , wherein one component of the first and second component is, prior to joining, a plat.
8. The method according to claim 1 , further comprising forming at least one wave front compensation structure, wherein the wave front compensation structure at least partially compensates a modification of the wave front existing after joining the first component and the second component.
9. The method according to claim 1 , wherein one component selected from the group consisting of the first component and the second component is a plano-convex or a plano-concave lens.
10. The method according to claim 9 , wherein the method used in b) for manufacturing the polarization-modulating optical element further comprises, prior to joining:
calculating a height profile of the first component in order to obtain a predefined distribution of retardation; and
forming the defined height profile on the first component.
11. The method according to claim 9 , wherein in the method used in b) joining is performed by wringing.
12. The method according to claim 9 , wherein in the method used in b) only one component of the first and second component is deformed during joining.
13. The method according to claim 9 , wherein in the method used in b) the mechanical stress is produced in only one component of the first and second component.
14. The method according to claim 9 , wherein in the method used in b) one component of the first and the second component has an average thickness being at least a tenfold.
15. The method according to claim 9 , wherein in the method used in b) one component of the first and second component is, prior to joining, a plat.
16. The method according to claim 1 , wherein the optical system is configured to be used in a microlithographic projection exposure apparatus.
17. The method according to claim 16 , wherein the optical subsystem is a projection objective of the microlithographic projection exposure apparatus.
18. The method according to claim 16 , wherein the optical subsystem is an illumination system of the microlithographic projection exposure apparatus.