Illumination System, In Particular For A Projection Exposure Machine In Semiconductor Lithography
An illumination system is provided with a light produced by a light source, with an optical axis and with optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one optical element for producing a pupil distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light. For an asymmetric pupil distribution at least the optical elements that produce non-rotationally symmetrical light distributions, and/or the homogenizing element are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x′-/y′-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a.
1 . An illumination system having a light produced by a light source, having an optical axis and having optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one diffractive optical element for producing a non-rotationally symmetric pupil light distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light, wherein for an asymmetric pupil distribution at least the diffractive optical elements that produce non-rotationally symmetrical pupil light distribution or the homogenizing element ( 10 ) are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x′-/y′-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a.
2 . An illumination system having a light produced by a light source, having an optical axis and having optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one diffractive optical element for producing a non-rotationally symmetric pupil light distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light, wherein for an asymmetric pupil distribution at least the diffractive optical elements that produce non-rotationally symmetrical pupil light distribution and the homogenizing element ( 10 ) are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x′-/y′-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a.
3 . The illumination system as claimed in claim 2 , wherein at least one rotatable diffractive optical element and the homogenizing element are rotated by the same rotational angle.
4 . The illumination system as claimed in claim 2 , wherein at least one rotatable diffractive optical element and the homogenizing element are rotated by different rotational angles.
5 . The illumination system as claimed in claim 1 , wherein provided as homogenizing element is a rectangular rod integrator that can be rotated by the rotational angle a for an asymmetric pupil distribution.
6 . The illumination system as claimed in claim 5 , wherein the cross section of the rod integrator is at least approximately square.
7 . The illumination system as claimed in claim 5 , wherein the rod integrator is arranged between an incoupling optics and a field plane having a field stop.
8 . The illumination system as claimed in claim 1 , wherein at least one diffractive optical element is situated upstream of the homogenizing element in the beam direction.
9 . The illumination system as claimed in claim 5 , wherein the rod integrator is arranged exchangeably in the illumination system, a rod integrator of square cross section being provided in exchange for a rod integrator of rectangular cross section in conjunction with setting a rotational angle.
10 . The illumination system as claimed in claim 9 , wherein the length of the diagonal of an end face of the rod integrator of rectangular cross section corresponds at least approximately to the edge length of the rod integrator of square cross section.
11 . The illumination system as claimed in claim 1 , wherein a honeycomb condenser is provided as homogenizing element.
12 . The illumination system as claimed in claim 2 , wherein a honeycomb condenser is provided as homogenizing element.
13 . A projection exposure machine in semiconductor lithography having an illumination system as claimed in claim 1 .
14 . A projection exposure machine in semiconductor lithography having an illumination system as claimed in claim 2 .
15 . An illumination system having a light produced by a light source, having an optical axis and having optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one optical element for producing a pupil distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light, wherein for an asymmetric pupil distribution at least the optical elements that produce non-rotationally symmetrical light distributions, or the homogenizing element are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x′-/y′-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a.
16 . An illumination system having a light produced by a light source, having an optical axis and having optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one optical element for producing a pupil distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light, wherein for an asymmetric pupil distribution at least the optical elements that produce non-rotationally symmetrical light distributions, and the homogenizing element are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x′-/y′-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a.
17 . The illumination system as claimed in claim 16 , wherein at least one rotatable optical element and the homogenizing element are rotated by the same rotational angle.
18 . The illumination system as claimed in claim 16 , wherein at least one rotatable optical element and the homogenizing element are rotated by different rotational angles.
19 . The illumination system as claimed in claim 15 , wherein provided as homogenizing element is a rectangular rod integrator that can be rotated by the rotational angle a for an asymmetric pupil distribution.
20 . The illumination system as claimed in claim 19 , wherein the cross section of the rod integrator is at least approximately square.
21 . The illumination system as claimed in claim 19 , wherein the rod integrator is arranged between an incoupling optics and a field plane having a field stop.
22 . The illumination system as claimed in claim 15 , wherein the optical elements are diffractive and/or refractive optical elements that are situated upstream of the homogenizing element in the beam direction.
23 . The illumination system as claimed in claim 19 , wherein the rod integrator is arranged exchangeably in the illumination system, a rod integrator of square cross section being provided in exchange for a rod integrator of rectangular cross section in conjunction with setting a rotational angle.
24 . The illumination system as claimed in claim 23 , wherein the length of the diagonal of an end face of the rod integrator of rectangular cross section corresponds at least approximately to the edge length of the rod integrator of square cross section.
25 . The illumination system as claimed in claim 24 , wherein refractive optical elements that are arranged upstream of the rod integrator in the beam direction are arranged exchangeably.
26 . The illumination system as claimed in claim 15 , wherein a honeycomb condenser is provided as homogenizing element.
27 . A projection exposure machine in semiconductor lithography having an illumination system as claimed in claim 15 .
28 . A projection exposure machine in semiconductor lithography having an illumination system as claimed in claim 16 .
29 . An illumination system having a light produced by a light source, having an optical axis and having optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one optical element for producing a pupil distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light, wherein for an asymmetric pupil distribution at least the optical elements that produce non-rotationally symmetrical light distributions, and the homogenizing element are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x′-/y′-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a and wherein at least one rotatable optical element and the homogenizing element are rotated by the same rotational angle.
30 . The illumination system as claimed in claim 29 , wherein the axis of rotation runs within the at least one optical element.
31 . The illumination system as claimed in claim 29 , wherein provided as homogenizing element is a rectangular rod integrator that can be rotated by the rotational angle a for an asymmetric pupil distribution.
32 . The illumination system as claimed in claim 31 , wherein the cross section of the rod integrator is at least approximately square.
33 . The illumination system as claimed in claim 29 , wherein the optical elements are diffractive and/or refractive optical elements that are situated upstream of the homogenizing element in the beam direction.
34 . The illumination system as claimed in claim 29 , wherein a honeycomb condenser is provided as homogenizing element.
35 . A projection exposure machine in semiconductor lithography having an illumination system as claimed in claim 29 .