Method for determining wavefront aberrations
View Patent ↗In a method for determining wavefront aberrations for the characterization of imaging characteristics in an optical imaging system, the measurement results from two different measurement methods, which are carried out at successive times, are combined. In this case, at least some of the aberration parameters which are determined in the previous first measurement method are used as a given precondition for determining aberration parameters with the aid of the second measurement method, and are assessed accordingly. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method can be avoided.
1. Method for determining wavefront aberrations for characterization of imaging characteristics of an optical imaging system comprising:
determining wavefront aberrations which are caused by the imaging system, using a first measurement method;
determining at least one first aberration parameter for the wavefront aberration on the basis of the first measurement method;
determining wavefront aberrations which are caused by the imaging system, with the aid of a second measurement method, which is used at a different time than the first measurement method; and
determining at least one second aberration parameter from the wavefront aberration on the basis of the second measurement method using at least the one first aberration parameter which results from the first measurement method.
2. Method according to claim 1 , wherein the first measurement method is used to determine a first set of first Zernike coefficients, and the second measurement method is used to determine a second set of second Zernike coefficients, in order to characterize the wavefront aberration.
3. Method according to claim 1 , wherein the first measurement method is used to determine at least one first aberration parameter which is essentially stable with respect to fluctuations, this at least one stable aberration parameter being taken into account for determining the second aberration parameter when carrying out the second measurement method, with its value determined using the first measurement method.
4. Method according to claim 3 , wherein at least one stable first aberration parameter corresponds to a Zernike coefficient whose order is greater than 2.
5. Method according to claim 1 , wherein the first measurement method is carried out at a location where the optical imaging system is produced, and the second measurement method is carried out at a location where the imaging method is used.
6. Method according to claim 1 , wherein the imaging system is transported from a first measurement location to a second measurement location between carrying out the first measurement method and carrying out the second measurement method.
7. Method according to claim 1 , wherein the first measurement method is a direct method for directly determining the wavefront aberrations.
8. Method according to claim 1 , wherein the first measurement method is an interferometric measurement method.
9. Method according to claim 8 , wherein the interferometric measurement method is based on Shearing interferometry.
10. Method according to claim 1 , wherein the second measurement method is an indirect method for indirectly determining the wavefront aberrations.
11. Method according to claim 10 , wherein the second measurement method comprises measuring an aerial image which is produced by the imaging system.
12. Method according to claim 10 , wherein the second measurement method is a resist-based method comprising at least one exposure of a substrate that is coated with a light-sensitive layer, and measuring the exposed substrate.