Collector configured of mirror shells

1. A collector comprising:

a first mirror shell positioned inside a second mirror shell that has a chamfered end.

2. The collector of claim 1 , wherein said collector receives light from a light source and reflects said light to illuminate an area in a plane.

3. The collector of claim 2 , wherein said chamfered end receives said light from said light source.

4. The collector of claim 1 ,

wherein said second mirror shell includes a portion that receives light and reflects said light, and

wherein said chamfered end receives said light from said portion, and further reflects said light.

5. The collector of claim 1 , wherein said second mirror shell has a thickness that decreases in a direction of said chamfered end.

6. The collector of claim 1 ,

wherein said first mirror shell receives light from a light source at an angle of incidence of less than 20° to a surface tangent of said first mirror shell, and

wherein said second mirror shell receives light from said light source at an angle of incidence of less than 20° to a surface tangent of said second mirror shell.

7. The collector of claim 1 , wherein at least one of said first and second mirror shells includes a first segment having a first optical surface and second segment having a second optical surface.

8. The collector of claim 7 ,

wherein said first segment is annular in a section of a hyperboloid, and

wherein said second segment is annular in a section of an ellipsoid.

9. The collector of claim 7 ,

wherein said first segment is annular in a section of a hyperboloid, and

wherein said second segment is annular in a section of a paraboloid.

10. An illumination system comprising:

a light source;

a plane; and

a collector that receives light from said light source, and illuminates an area in said plane,

wherein said collector has a first mirror shell positioned inside a second mirror shell that has a chamfered end.

11. The illumination system of claim 10 , further comprising an optical element having a plurality of raster elements in a light path from said light source to said plane.

12. The illumination system of claim 11 ,

wherein said collector illuminates an annular region in said plane, and

wherein said plurality of raster elements are in said annular region.

13. An EUV-projection exposure facility comprising:

the illumination system of claim 10 for illuminating a mask; and

a projection objective for imaging said mask onto a light sensitive object.

14. A method of manufacturing a micro-electronic component, comprising using the EUV-projection exposure facility of claim 13 .