Catadioptric projection system for 157 nm lithography
View Patent ↗A photolithography reduction projection catadioptric objective includes a first optical group including an even number of at least four mirrors, and a second at least substantially dioptric optical group more imageward than the first optical group including a number of lenses for providing image reduction. The first optical group provides compensative axial color correction for the second optical group.
1. A system, comprising:
a plurality of optical elements arranged along an optical axis between an object plane and an image plane, the plurality of optical elements including mirrors where each mirror defines a corresponding surface that is rotationally symmetric about the optical axis, each surface intersecting the optical axis at a corresponding intersection point, wherein:
the plurality of optical elements define a pupil plane which intersects the optical axis at a position that is closer to an intersection point of a one of the mirrors than to any of the other optical elements,
the system is a catadioptric microlithography projection objective,
a total number of mirrors in the catadioptric microlithography projection objective is even,
the optical axis is a single straight line between the object plane and the image plane, and
the catadioptric projection objective has an image-side numerical aperture of 0.75 or more.
2. The system of claim 1 , wherein the plurality of optical elements includes at least four mirrors.
3. The system of claim 1 , wherein the plurality of optical elements includes at least six mirrors.
4. The system of claim 1 , wherein the plurality of optical elements comprise at least one lens arranged relative to the other optical elements so that during operation radiation directed from the object plane to the image plane makes a double pass through the at least one lens.
5. The system of claim 4 , wherein the at least one lens is adjacent to one of the mirrors in the radiation path from the object plane to image plane.
6. The system of claim 4 , wherein the at least one lens is adjacent in the radiation path to the mirror whose corresponding intersection point is closest to the pupil.
7. The system of claim 4 , wherein the at least one lens is a negative lens.
8. The system of claim 1 , wherein the plurality of optical elements includes a plurality of lenses and all of the lenses are formed from the same material.
9. The system of claim 1 , wherein the plurality of optical elements includes at least one lens formed from CaF 2.
10. The system of claim 9 , wherein the lens closest to the image plane is formed from CaF 2.
11. The system of claim 1 , wherein the system is configured to image a ring-shaped field at the object plane to the image plane.
12. The system of claim 1 , wherein the system is configured to image a rectangular-shaped field at the object plane to the image plane.
13. The system of claim 1 , wherein the system is configured to image an off-axis field at the object plane to the image plane.
14. The system of claim 1 , wherein the catadioptric projection objective has an image-side numerical aperture of 0.8 or more.
15. The system of claim 1 , wherein the mirrors comprise a pair of concave mirrors that are adjacent to one another in a path of the radiation from the object plane to the image plane.
16. The system of claim 15 , wherein during operation the catadioptric projection objective forms an intermediate image of an object at the object plane between the pair of concave mirrors.
17. The system of claim 1 , wherein the catadioptric projection objective is a dry catadioptric projection objective.
18. A system, comprising:
a plurality of optical elements arranged along an optical axis between an object plane and an image plane, the plurality of optical elements including mirrors where each mirror defines a corresponding surface that is rotationally symmetric about the optical axis, each surface intersecting the optical axis at a corresponding intersection point, wherein:
the plurality of optical elements define a pupil plane which intersects the optical axis at a position that is closer to an intersection point of a one of the mirrors than to any of the other optical elements,
the system is a catadioptric microlithography projection objective,
a total number of mirrors in the catadioptric microlithography projection objective is even,
the optical axis is a single straight line between the object plane and the image plane, and
the system is configured to image a rectangular-shaped field at the object plane to the image plane.
19. A system, comprising:
a plurality of optical elements arranged along an optical axis between an object plane and an image plane, the plurality of optical elements including mirrors where each mirror defines a corresponding surface that is rotationally symmetric about the optical axis, each surface intersecting the optical axis at a corresponding intersection point, wherein:
the plurality of optical elements define a pupil plane which intersects the optical axis at a position that is closer to an intersection point of a one of the mirrors than to any of the other optical elements, the plurality of optical elements including at least four mirrors,
the system is a catadioptric microlithography projection objective,
a total number of mirrors in the catadioptric microlithography projection objective is even, and
the optical axis is a single straight line between the object plane and the image plane.
20. The system of claim 19 , wherein the catadioptric projection objective has an image-side numerical aperture of 0.65 or more.
21. The system of claim 19 , wherein the catadioptric projection objective has an image-side numerical aperture of 0.7 or more.