Mirror for use in a projection exposure apparatus
View Patent ↗A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.
1. A mirror for use in a projection exposure apparatus, comprising:
a main surface extending beyond an outline of an optical surface of the main surface,
wherein the optical surface has a roughness of less than 1 nm rms,
wherein the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm, and
wherein the optical surface has a diameter of at least 100 mm.
2. A mirror for use in a projection exposure apparatus, comprising:
a main surface extending beyond an outline of an optical surface of the main surface,
wherein the optical surface has a roughness of less than 1 nm rms,
wherein the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm,
wherein the optical surface has a diameter of at least 100 mm, and
wherein the portion of the main surface extending beyond the optical surface by less than 0.2 mm includes a beveled edge adjacent to the outline of the optical surface, the beveled edge comprising an inclined surface extending at a bevel angle with respect to the main surface, wherein the bevel angle is less than an angle between the main surface and a direction orthogonal to the optical surface.
3. The mirror according to claim 2 , wherein the bevel angle is in a range of about 35 degrees to about 55 degrees.
4. The mirror according to claim 2 , wherein the mirror comprises a substrate having said main surface, and wherein a lateral surface of the substrate disposed adjacent to the inclined surface extends in the direction orthogonal to the optical surface, the inclined surface being disposed between the lateral surface and the main surface.
5. The mirror according to claim 2 , the width of the inclined surface is less than 0.4 mm.
6. A mirror for use in a projection exposure apparatus, comprising:
a main surface extending beyond an outline of an optical surface of the main surface,
wherein the optical surface has a roughness of less than 1 nm rms, and
wherein the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm, and
wherein the optical surface has an aspherical shape.
7. The mirror according to claim 6 , wherein the portion of the main surface extending beyond the optical surface by less than 0.2 mm includes a beveled edge adjacent to the outline of the optical surface, the beveled edge comprising an inclined surface extending at a bevel angle with respect to the main surface, wherein the bevel angle is less than an angle between the main surface and a direction orthogonal to the optical surface.
8. The mirror according to claim 6 , wherein the bevel angle is in a range of about 35 degrees to about 55 degrees.
9. The mirror according to claim 6 , wherein the mirror comprises a substrate having said main surface, and wherein a lateral surface of the substrate disposed adjacent to the inclined surface extends in the direction orthogonal to the optical surface, the inclined surface being disposed between the lateral surface and the main surface.
10. The mirror according to claim 6 , the width of the inclined surface is less than 0.4 mm.