Apparatus for polarization-specific examination, optical imaging system, and calibration method
View Patent ↗A device for polarization-specific examination of an optical system having a detector part that has polarization detector means for recording the exit state of polarization of radiation emerging from the optical system. Also, an associated optical imaging system, and a calibration method for the device. The device includes a polarization detector with a polarizing grating structure. Provided as an alternative is a device for snapshot polarimetry having a birefringent element and downstream polarizer element that adequately polarizes nonquasi-parallel radiation. The device may be used for determining the influence on the state of polarization of UV radiation by a microlithographic projection objective.
1. A device for polarization-specific examination of an optical system having
a detector part with polarization detector means for recording an exit state of polarization of radiation emerging from the optical system, wherein
the polarization detector means include a polarizing grating structure,
the detector part comprises a periodic diffraction structure, and
the polarizing grating structure is arranged in a beam path upstream or downstream of the periodic diffraction structure.
2. The device as claimed in claim 1 , wherein the device is set up for polarization-specific examination of an optical imaging system, and wherein the periodic diffraction structure is arranged substantially in an image plane of the imaging system, and/or the polarizing grating structure is arranged close to the image plane.
3. The device as claimed in claim 1 , wherein the polarizing grating structure and the periodic diffraction structure are arranged on a common carrier, one of the two structures being arranged on a front side of the carrier, and the other being arranged on a rear side of the carrier.
4. The device as claimed in claim 1 , wherein a wavelength of the radiation is below approximately 400 nm.
5. The device as claimed in claim 4 , wherein the wavelength of the radiation is between approximately 140 nm and approximately 200 nm.
6. The device as claimed in claim 4 , wherein the wavelength of the radiation is below 140 nm.
7. The device as claimed in claim 1 , wherein the device determines an influencing of the state of polarization of the radiation by the optical system.
8. A device for polarization-specific examination of an optical system having
a detector part with polarization detector means for recording an exit state of polarization of radiation emerging from the optical system, wherein
the polarization detector means include a polarizing grating structure, and
the device is a shearing interferometry, point diffraction interferometry, Shack-Hartmann or Litel type device, and/or the device is set up for a pupil-resolved determination of an influencing of the state of polarization of radiation by a microlithographic projection objective.
9. The device as claimed in claim 8 , wherein the device determines the influencing of the state of polarization of the radiation by the microlithographic projection objective.
10. The device as claimed in claim 8 , wherein the detector part comprises a periodic diffraction structure, and the polarizing grating structure is arranged in a beam path upstream or downstream of the periodic diffraction structure.
11. The device as claimed in claim 8 , wherein the device is set up for polarization-specific examination of an optical imaging system, and wherein the periodic diffraction structure is arranged substantially in an image plane of the imaging system, and/or the polarizing grating structure is arranged close to the image plane.
12. The device as claimed in claim 8 , wherein the polarizing grating structure and the periodic diffraction structure are arranged on a common carrier, one of the two structures being arranged on a front side of the carrier, and the other being arranged on a rear side of the carrier.
13. The device as claimed in claim 8 , wherein a wavelength of the radiation is below approximately 400 nm.
14. The device as claimed in claim 13 , wherein the wavelength of the radiation is between approximately 140 nm and approximately 200 nm.
15. The device as claimed in claim 13 , wherein the wavelength of the radiation is below 140 nm.
16. A device for polarization-specific examination of an optical system having
a detector part with polarization detector means for recording an exit state of polarization of radiation emerging from the optical system, wherein
the polarization detector means include a polarizing grating structure, and
the optical system is a microlithography projection objective.
17. The device as claimed in claim 16 , wherein the device determines an influencing of the state of polarization of the radiation by the optical system.
18. The device as claimed in claim 16 , wherein the detector part comprises a periodic diffraction structure, and the polarizing grating structure is arranged in a beam path upstream or downstream of the periodic diffraction structure.
19. The device as claimed in claim 16 , wherein the device is set up for polarization-specific examination of an optical imaging system, and wherein the periodic diffraction structure is arranged substantially in an image plane of the imaging system, and/or the polarizing grating structure is arranged close to the image plane.
20. The device as claimed in claim 16 , wherein the polarizing grating structure and the periodic diffraction structure are arranged on a common carrier, one of the two structures being arranged on a front side of the carrier, and the other being arranged on a rear side of the carrier.
21. The device as claimed in claim 16 , wherein the device is a shearing interferometry, point diffraction interferometry, Shack-Hartmann or Litel type device, and/or the device is set up for a pupil-resolved determination of an influencing of the state of polarization of the radiation by a microlithographic projection objective.
22. The device as claimed in claim 16 , wherein a wavelength of the radiation is below approximately 400 nm.
23. The device as claimed in claim 22 , wherein the wavelength of the radiation is between approximately 140 nm and approximately 200 nm.
24. The device as claimed in claim 22 , wherein the wavelength of the radiation is below 140 nm.
25. A device for polarization-specific examination of an optical system having
a detector part with polarization detector means for recording an exit state of polarization of radiation emerging from the optical system, wherein
the polarization detector means include a polarizing grating structure, and
a wavelength of the radiation is below approximately 400 nm.
26. The device as claimed in claim 25 , wherein the device determines an influencing of the state of polarization of the radiation by the optical system.
27. The device as claimed in claim 25 , wherein the device is set up for polarization-specific examination of an optical imaging system, and wherein the periodic diffraction structure is arranged substantially in an image plane of the imaging system, and/or the polarizing grating structure is arranged close to the image plane.
28. The device as claimed in claim 25 , wherein the polarizing grating structure and the periodic diffraction structure are arranged on a common carrier, one of the two structures being arranged on a front side of the carrier, and the other being arranged on a rear side of the carrier.