Granted Patent B2

US 7,289,223 · App. 10/765,904 · Granted Oct 30, 2007

Assignee: Carl Zeiss SMT AG

Abstract

Claims (23)

1. A method for the spatially resolved polarimetric examination of an imaging beam pencil generated by a radiation source of pulsed operation, comprising:

introducing a first photoelastic modulator, a second photoelastic modulator and a polarization element into a path of the beam pencil,

activating a first modulation oscillation of the first photoelastic modulator and a second modulation oscillation of the second photoelastic modulator,

generating the beam pencil and driving of the radiation source for outputting a respective radiation pulse in a manner dependent on the oscillation state of at least one of the first photoelastic modulator and the second photoelastic modulator, and

detecting the beam pencil coming from the polarization element with a spatially resolving detector.

2. The method as claimed in claim 1 , wherein the first and second modulation oscillations are activated with different oscillation frequencies, and further comprising performing a plurality of measurement operations for different phase angles of the two modulation oscillations of the photoelastie modulators and determining a spatially resolved Stokes vector from results of the measurement operations utilizing the spatially resolving detector.

3. The method as claimed in claim 2 , wherein at least four of the measurement operations are carried out respectively for phase angle pairs (α 1 , α 2 ), (α 1 , α 2 +90°), (α 1 +90°,α 2 ) and (α 1 +90°,α 2 +90°) of the phase angles of the two modulation oscillations of the photoelastic modulators, where α 1 and α 2 designate predetermined phase angles.

4. The method as claimed in claim 3 , wherein the phase angles α 1 and α 2 are both predetermined as 0°.

5. The method as claimed in claim 2 , wherein the difference between the oscillation frequencies of the two photoelastic modulators is in the range of between 0.1 kHz and 10 kHz.

6. The method as claimed in claim 5 , wherein the oscillation frequency difference is around 1 kHz.

7. The method as claimed in one of claims 1 to 6 , further comprising introducing a sample system into the beam path of the beam pencil.

8. The method as claimed in claim 7 , wherein the sample system is a projection objective of a microlithography projection exposure apparatus.

9. The method as claimed in claim 8 , further comprising performing an interferometric wavefront measurement of the projection objective using the beam pencil.

10. The method as claimed in claim 7 , wherein the two photoelastic modulators are positioned at essentially equal distances from a convergence point of the beam pencil.

11. An apparatus for the spatially resolved polarimetric examination of an imaging beam pencil, comprising:

a pulsed radiation source generating the beam pencil,

a first photoelastic modulator, a second photoelastic modulator and a polarization element, each positioned in a beam path of the beam pencil,

a control unit controlling the photoelastic modulators and driving the pulsed radiation source in a manner correlated with the control of the photoelastic modulators, and

a spatially resolving detector detecting the beam pencil coming from the polarization element.

12. The apparatus as claimed in claim 11 , wherein an evaluation unit is provided, which determines a spatially resolved Stokes vector on the basis of the detection information from the detector.

13. The apparatus as claimed in claim 11 , with a sample system inserted into the beam path of the beam pencil and configured for the spatially resolved polarimetric examination of the imaging beam pencil.

14. The apparatus as claimed in claim 13 , wherein the sample system is an optical imaging system and the examination comprises a pupil-resolved interferometric wavefront measurement of the optical imaging system.

15. The apparatus as claimed in claim 14 , wherein the sample system is a microlithography projection objective.

Assignments (10)

Priority Claims (1)

Continuity (2)