Illumination system for a microlithgraphic exposure apparatus
An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
1. An optical system,
a) a pupil plane,
b) a field plane,
c) a condenser that transforms the pupil plane into the field plane,
d) a field stop objective that images the field plane onto a mask plane, wherein the field stop objective at least partly corrects a residual pupil aberration of the condenser, wherein the optical system is an illumination system of a microlithographic projection exposure apparatus.
2. The optical system of claim 1 , wherein
a) the condenser has a maximum telecentricity error angle α c and
b) the field stop objective has an image side maximum telecentricity error angle α o <0.8·α c .
3. The optical system of claim 2 , wherein α o <0.5·α c .
4. The optical system of claim 3 , α o <0.3·α c .
5. The optical system of claim 2 , wherein α o <0.5 mrad.
6. The optical system of claim 1 , wherein the field stop objective has an image side numerical aperture NA i , and a maximum image height h max with NA i ·h max >15 mm.
7. The optical system of claim 1 , wherein the condenser comprises at least four meniscus lenses.
8. The optical system of claim 1 , comprising a diaphragm configured to shield double-reflected light and/or scattering light.
9. The optical system of claim 8 , wherein the diaphragm is positioned in or in close proximity to a pupil plane of the field stop objective.
10. The optical system of claim 8 , wherein the diaphragm is positioned at a position before any optical element that is adjustable to modify the angular distribution of projection light, if seen in a propagation direction along which the projection light propagates.
11. The optical system of claim 10 , wherein the adjustable optical element is movable along an optical axis.
12. The optical system of claim 11 , wherein the adjustable optical element is a lens of a zoom objective.
13. The optical system of claim 8 , comprising an optical raster element which is the first optical element that increases the geometrical optical flux, and wherein the diaphragm is positioned in front of the optical raster element if seen in a propagation direction along which the projection light propagates.
14. The optical system of claim 8 , comprising a (de)polarizer to (de)poloarize projection light, and wherein the diaphragm is positioned in front of the (de)polarizer if seen in a propagation direction along which the projection light propagates.
15. The optical system of claim 8 , wherein the diaphragm has a variable aperture.
16. The optical system of claim 15 , comprising an adjusting mechanism to vary the aperture of the diaphragm.
17. The optical system of claim 8 , wherein the diaphragm is formed by a layer that is opaque for projection light and is applied to an optical element through which projection light propagates or is reflected from.
18. The optical system of claim 1 , wherein
a) the condenser has a first concave optical surface positioned immediately adjacent the field plane and having a radius of curvature r i and an axial distance d i from the field plane with d i <r i <2.5·d i , and
b) the field stop objective has a second concave optical surface being positioned immediately adjacent the field plane and having a radius of curvature r 2 and an axial distance d 2 from the field plane with d 2 <r 2 <2.5·d 2 .
19. The optical system of claim 18 , wherein the working distance of the field stop objective from the field plane is between 10 mm and 90 mm.
20. The optical system of claim 18 , wherein the radius of curvature r i is greater than 80 mm.
21. The optical system of any of claims 18 , wherein the radius of curvature r 2 is greater than 80 mm.
22. The optical system of claim 1 , wherein
a) the condenser focuses a collimated light bundle entering the pupil plane onto a spot in the field plane having a spot diameter of less than 1.2 mm, and
b) the field stop objective images a point in the field plane on the mask as a spot with a spot diameter of less than 0.4 mm.
23. A microlithographic projection exposure apparatus, comprising the optical system of claim 1 .
24. A microlithographic method of fabricating a micro- structured device, comprising the following steps:
a) providing a substrate supporting a light sensitive layer;
b) providing a mask containing structures to be imaged onto the light sensitive layer;
c) providing a projection exposure apparatus of claim 23 ;
d) projecting at least a part of the mask onto the light sensitive layer.
25. An optical system, comprising:
a) a pupil plane,
b) a field plane,
c) a condenser that transforms the pupil plane into the field plane, wherein the condenser focuses a collimated light bundle entering the pupil plane onto a spot in the field plane having a spot diameter of less than 1.2 mm,
d) a field stop objective that images the field plane onto a mask plane, wherein the field stop objective images a point in the field plane on the mask as a spot with a spot diameter of less than 0.4 mm, and wherein the field stop objective has an image side numerical aperture NA i , and a maximum image height h max with NA i ·h max >15 mm,
wherein the optical system is an illumination system of a microlithographic projection exposure apparatus.