Microlithography projection system with an accessible diaphragm or aperture stop

1. A microlithography projection system configured so that during operation the microlithography projection system images an object plane onto an image field in an image plane, the microlithography projection system comprising:

a first group of mirrors;

a second group of mirrors; and

a diaphragm arranged in a diaphragm plane between the first group of mirrors and the second group of mirrors, the diaphragm plane being situated in or near a conjugated plane to an exit pupil plane of the microlithography projection system,

wherein during operation of the microlithography projection system rays of a light beam pass along an optical path through the microlithography projection system from the object plane to the image plane from the first group of mirrors to the second group of mirrors and the optical path only passes through the diaphragm plane once.

2. The microlithography projection system of claim 1 , wherein the diaphragm is situated between a first mirror in the first group of mirrors and a second mirror in the second group of mirrors, the first mirror being positioned a first distance from the image plane as measured along an optical axis of the microlithography projection system, and the second mirror being positioned a second distance from the image plane as measured along the optical axis of the microlithography projection system, the first distance being greater than the second distance.

3. The microlithography projection system of claim 2 , wherein the second distance is 0.3 times the first distance.