Projection objective and method for optimizing a system aperture stop of a projection objective
View Patent ↗In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.
1. An apparatus, comprising:
a plurality of optical elements; and
a system aperture stop having an inner aperture stop border defining an aperture stop opening having a shape that emulates a nonlinear stretched ellipse,
wherein:
the apparatus is configured so that during operation the apparatus projects an image of an object field in an object plane onto an image field in an image plane; and
the apparatus is a projection objective configured to be used in a microlithography exposure apparatus.
2. The apparatus of claim 1 , wherein the plurality of optical elements is arranged along an optical system axis.
3. The apparatus of claim 2 , wherein a centroid of the image field is arranged at a lateral distance from the optical system axis.
4. The apparatus of claim 2 , wherein a projection of the inner aperture stop border onto a plane orthogonal to the optical system axis is off-centered from the optical system axis.
5. An apparatus, comprising:
a plurality of optical elements; and
a system aperture stop having an inner aperture stop border defining an aperture stop opening whose shape is defined by a border contour curve, the border contour curve being an irregular polygon in which at least one corner deviates from a circular line which envelops the polygon on the outside,
wherein:
the apparatus is configured so that during operation the apparatus projects an image of an object field in an object plane onto an image field in an image plane;
the system aperture stop has only one axis of symmetry; and
the apparatus is a projection objective configured to be used in a microlithography exposure apparatus.
6. The apparatus of claim 5 , wherein the plurality of optical elements is arranged along an optical system axis.
7. The apparatus of claim 6 , wherein a centroid of the image field is arranged at a lateral distance from the optical system axis.
8. The apparatus of claim 6 , wherein a projection of the inner aperture stop border onto a plane orthogonal to the optical system axis is off-centered from the optical system axis.
9. The apparatus of claim 5 , wherein the sides of the polygon are configured as curved lines.
10. The apparatus of claim 5 , wherein the shape of the polygon emulates a nonlinear stretched ellipse.
11. The apparatus of claim 5 , wherein the border contour curve is configured as a planar curve.