OPTICAL DEVICES HAVING KINEMTAIC COMPONENTS
Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees of freedom can be x-displacement, y-displacement, z-displacement or tilt.
1 . An optical device, comprising:
at least one optical element which can be manipulated in n degrees of freedom; and
a plurality of kinematic components configured to manipulate and/or determine a position of the at least one optical element,
wherein:
the plurality of kinematic components includes a number m of a first type;
m is greater than n; and
at least one of the n degrees of freedom comprises a degree of freedom selected from the group consisting of x-displacement, y-displacement, z-displacement and tilt.
2 . The optical device according to claim 1 , wherein at least two kinematic components of the first type are present for at least one of the n degrees of freedom.
3 . The optical device according to claim 1 , wherein at least two kinematic components of the first type are present for each of the n degrees of freedom.
4 . The optical device according to claim 1 , wherein at least two kinematic components are assigned to a point of action on the at least one optical element.
5 . The optical device according to claim 4 , wherein for a specific degree of freedom at least one first kinematic component is arranged in relation to a further kinematic component in such a way that upon activation of the first kinematic component the further kinematic component is likewise activated.
6 . The optical device according to claim 1 , wherein at least one kinematic component is an actuator.
7 . The optical device according to claim 5 , wherein the first and the further kinematic components are individual piezostacks of a piezocrawler.
8 . The optical device according to claim 4 , wherein for a specific degree of freedom at least one first kinematic component is arranged in relation to a further kinematic component in such a way that upon activation of the first kinematic component the further kinematic component is not activated.
9 . The optical device according to claim 1 , wherein at least one kinematic component is a sensor.
10 . A projection exposure machine, comprising:
an optical device, comprising:
at least one optical element which can be manipulated in n degrees of freedom; and
a plurality of kinematic components configured to manipulate and/or determine a position of the at least one optical element,
wherein:
the plurality of kinematic components includes a number m of a first type;
m is greater than n;
at least one of the n degrees of freedom comprises a degree of freedom selected from the group consisting of x-displacement, y-displacement, z-displacement and tilt; and
the projection exposure machine is a projection exposure machine for semiconductor lithography.
11 . The projection exposure machine according to claim 10 , wherein at least two kinematic components of the first type are present for at least one of the n degrees of freedom.
12 . The projection exposure machine according to claim 10 , wherein at least two kinematic components of the first type are present for each of the n degrees of freedom.
13 . The projection exposure machine according to claim 10 , wherein at least two kinematic components are assigned to a point of action on the at least one optical element.
14 . The projection exposure machine according to claim 13 , wherein for a specific degree of freedom at least one first kinematic component is arranged in relation to a further kinematic component in such a way that upon activation of the first kinematic component the further kinematic component is likewise activated.
15 . The projection exposure machine according to claim 10 , wherein at least one kinematic component is an actuator.
16 . The projection exposure machine according to claim 14 , wherein the first and the further kinematic components are individual piezostacks of a piezocrawler.
17 . The projection exposure machine according to claim 13 , wherein for a specific degree of freedom at least one first kinematic component is arranged in relation to a further kinematic component in such a way that upon activation of the first kinematic component the further kinematic component is not activated.
18 . The projection exposure machine according to claim 10 , wherein at least one kinematic component is a sensor.