Microlithographic projection exposure apparatus
View Patent ↗A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
1. An apparatus, comprising:
a housing,
a final lens element,
a terminating element having a first surface and no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the apparatus;
a fastening member which is fixedly attached to the housing of the apparatus and supports the terminating element in an adjustable manner such that the position of the terminating element with respect to the fastening member is adjustable;
a first liquid between the terminating element and the final lens element;
a second liquid contacting a second surface of the terminating element, the second liquid extending to the image plane of the apparatus, the second surface of the terminating element is opposite the first surface of the terminating element,
wherein the apparatus is a projection lens of a microlithographic projection exposure system.
2. The apparatus according to claim 1 , wherein the fastening member comprises a micrometer screw.
3. The apparatus of claim 2 , wherein the terminating element is a flexible membrane.
4. An apparatus, comprising:
an illumination system to generate projection light, and
a projection lens, the projection lens comprising:
a final lens element,
a deformable membrane having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens, and is received in a frame that is configured to be tilted around a tilt axis, and
a liquid in an interspace formed between the final lens element and the deformable membrane,
wherein the apparatus is a microlithographic projection exposure system.
5. The apparatus of claim 4 , further comprising a fastening member which is fixedly attached to the housing of the apparatus and supports the flexible membrane in an adjustable manner such that the position of the flexible membrane with respect to the fastening member is adjustable.
6. The apparatus of claim 5 , wherein the fastening member comprises a micrometer screw.
7. An apparatus, comprising:
a housing,
a final lens element,
a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the apparatus;
a fastening member which is fixedly attached to the housing of the apparatus and supports the terminating element in an adjustable manner such that the position of the terminating element with respect to the fastening member is adjustable; and
a liquid between the terminating element and the image plane, the liquid extending without interruption to the image plane of the apparatus,
wherein the apparatus is a projection lens of a microlithographic projection exposure system.
8. The apparatus of claim 7 , wherein the fastening member comprises a micrometer screw.