Protective coating system for reflective optical elements, reflective optical element and method for the production thereof
View Patent ↗A limiting factor in the operation of EUV lithographic devices is the lifetime or the reflectivity of the reflective optics that is reduced by contamination with carbon-containing substances. Protective coatings that are resistant to oxidation or are inert against water are already known. According to the invention it is proposed to deposit protective coatings on, for example, multilayers that suppress the growth of carbon-containing substances in combination with layers that are inert against residual gas atmosphere and energy input. Even with a long operating time a high reflectivity is thereby retained. The protective coatings may be deposited by electron-beam vaporization, magnetron- or ion-beam sputtering.
1. A protective coating system for reflective optical elements for the EUV and soft X-ray range, comprising: an upper coating system having a thickness of 0.7 nm to 9 nm that comprises at least one uppermost layer made of one of the group consisting of an aluminum oxide, a beryllium aluminum oxide, a beryllium magnesium aluminum oxide, a titanium oxide, a magnesium oxide, a magnesium aluminum oxide, a manganese oxide, a nickel aluminum oxide, a sodium titanium oxide, an antimony oxide, a cerium titanium oxide, a cerium oxide, a strontium oxide, a zirconium oxide, a yttrium oxide, a rhodium oxide, a hafnium oxide, a ruthenium oxide, a boron oxide, a beryllium oxide, a calcium titanium oxide, a silicon nitride, a boron nitride, a silicon oxide, and a silicon carbide, and a lower coating system having a thickness of 1 nm to 16 nm that comprises at least one layer made of one of the group consisting of B x C y , Mo x B y , B x N y , Si x N y , Si x C y , Be x O y , Si x O y , Ti, Ti x N y , Cu x Au y , Ni, Ru, Rh, Ir, Au, Pd, Pt, Os, Sm, Gd, Al x O y , K x Cl y , K, Hf, Th x F y , Na x F y , Li x F y , Mg x F y , La x F y , amorphous carbon, Y, Nb, Rh x O y , Ru x O y , Ce, and Si x H y , wherein the protective coating system consists of one layer of a ruthenium oxide as upper coating system, a one layer of ruthenium or one layer of B 4 C as the lower coating system are excluded.
2. The protective coating system according to claim 1 , wherein the at least one uppermost layer is inert against external electromagnetic fields.
3. The protective coating system according to claim 2 , wherein the optical thickness of the protective coating system is adjusted to the optical thickness of the reflective optical element.
4. The protective coating system according to claim 2 , wherein the at least one uppermost layer shows a real part of the refractive index between 0.84 and 0.98.
5. The protective coating system according to claim 2 , wherein the at least one inert layer of the lower coating system shows a real part of the refractive index between 0.84 and 0.98.
6. The protective coating system according to claim 1 , wherein the optical thickness of the protective coating system is adjusted to the optical thickness of the reflective optical element.
7. The protective coating system according to claim 1 , wherein the at least one uppermost layer shows a real part of the refractive index between 0.84 and 0.98.
8. The protective coating system according to claim 1 , wherein the at least one inert layer of the lower coating system shows a real part of the refractive index between 0.84 and 0.98.
9. A reflective optical element for the EUV and soft X-ray wavelength range, comprising: a protective coating system comprising an upper coating system having a thickness of 0.7 nm to 9 nm that comprises at least one uppermost layer made of one of the group consisting of an aluminum oxide, a beryllium aluminum oxide, a beryllium magnesium aluminum oxide, a titanium oxide, a magnesium oxide, a magnesium aluminum oxide, a manganese oxide, a nickel aluminum oxide, a sodium titanium oxide, an antimony oxide, a cerium titanium oxide, a cerium oxide, a strontium oxide, a zirconium oxide, a yttrium oxide, a rhodium oxide, a hafnium oxide, a ruthenium oxide, a boron oxide, a beryllium oxide, a calcium titanium oxide, a silicon nitride, a boron nitride, a silicon oxide, and a silicon carbide, and a lower coating system having a thickness of 1 nm to 16 nm that comprises at least one layer made of one of the group consisting of B x C y , Mo x B y , B x N y , Si x N y , Si x C y , Be x O y , Si x O y , Ti, Ti x N y , Cu x Au y , Ni, Ru, Rh, Ir, Au, Pd, Pt, Os, Sm, Gd, Al x O y , K x Cl y , K, Hf, Th x F y , Na x F y , Li x F y , Mg x F y , La x F y , amorphous carbon, Y, Nb, Rh x O y , Ru x O y , Ce, and Si x H y , except that when the protective coating system consists of one layer of a ruthenium oxide as upper coating system, a one layer of ruthenium or one layer of B 4 C as the lower coating system are excluded.
10. The reflective optical element according to claim 9 , wherein the protective coating system is arranged on a multilayer that is situated on a substrate.
11. The reflective optical element according to claim 10 , wherein the reflective optical element shows a maximum reflectivity between the wavelengths of 11.0 nm and 15.0 nm.
12. The reflective optical element according to claim 10 , wherein the multilayer shows a period with a thickness of 5.0 nm to 18 nm.
13. The reflective optical element according to claim 10 , wherein the reflective optical element shows a maximum reflectivity of >55%.
14. The reflective optical element according to claim 10 , wherein the reflective optical element includes an additional layer between multilayer and substrate.
15. The reflective optical element according to claim 10 , wherein the at least one uppermost layer is inert against external electromagnetic fields, or wherein the optical thickness of the protective coating system is adjusted to the optical thickness of the reflective optical element, or wherein the at least one uppermost layer shows a real part of the refractive index between 0.84 and 0.98, or wherein the at least one inert layer of the lower coating system shows a real part of the refractive index between 0.84 and 0.98, or combinations thereof.
16. The reflective optical element according to claim 15 , wherein the multilayer comprises a Mo/Si-, a Mo/Be-, a Mo 2 C/Si-, or a Mo 2 C/Be-multilayer, or wherein the multilayer shows at least one intermediate layer, or wherein the reflective optical element shows a maximum reflectivity between the wavelengths of 11.0 nm and 15.0 nm, or wherein the multilayer shows a period with a thickness of 5.0 nm to 18 nm, or wherein the reflective optical element shows a maximum reflectivity of >55%, or wherein the reflective optical element shows an additional layer between multilayer and substrate, or combinations thereof.
17. The reflective optical element according to claim 10 , wherein the multilayer comprises a Mo/Si-, a Mo/Be-, a MO 2 C/Si-, or a Mo 2 C/Be-multilayer.
18. The reflective optical element according to claim 17 , wherein the multilayer shows at least one intermediate layer.
19. The reflective optical element according to claim 9 , wherein the reflective optical element shows a maximum reflectivity between the wavelengths of 11.0 nm and 15.0 nm.
20. The reflective optical element according to claim 9 , wherein the reflective optical element shows a maximum reflectivity of >55%.
21. The reflective optical element according to claim 9 , wherein the at least one uppermost layer is inert against external electromagnetic fields, or wherein the optical thickness of the protective coating system is adjusted to the optical thickness of the reflective optical element, or wherein the at least one uppermost layer shows a real part of the refractive index between 0.84 and 0.98, or wherein the at least one inert layer of the lower coating system shows a real part of the refractive index between 0.84 and 0.98, or combinations thereof.
22. A protective coating system for reflective optical elements for the EUV and soft X-ray range, comprising: an upper coating system having a thickness of 0.7 nm to 9 nm that comprises at least one uppermost layer made of one of the group consisting of an aluminum oxide, a beryllium aluminum oxide, a beryllium magnesium aluminum oxide, a titanium oxide, a magnesium oxide, a magnesium aluminum oxide, a manganese oxide, a nickel aluminum oxide, a sodium titanium oxide, an antimony oxide, a cerium titanium oxide, a cerium oxide, a strontium oxide, a zirconium oxide, a yttrium oxide, a rhodium oxide, a hafnium oxide, a boron oxide, a beryllium oxide, a calcium titanium oxide, a silicon nitride, a boron nitride, a silicon oxide, and a silicon carbide, and a lower coating system having a thickness of 1 nm to 16 nm that comprises at least one layer made of one of the group consisting of B x C y with x≠4 and y≠1, Mo x B y , B x N y , Si x N y , Si x C y , Be x O y , Si x O y , Ti, Ti x N y , Cu x Au y , Ni, Rh, Ir, Au, Pd, Pt, Os, Sm, Gd, Al x O y , K x Cl y , K, Hf, Th x F y , Na x F y , Li x F y , Mg x F y , La x F y , amorphous carbon, Y, Nb, Rh x O y , Ru x O y , Ce, and Si x H y .
23. A reflective optical element for the EUV and soft X-ray wavelength range, comprising: a protective coating system comprising an upper coating system having a thickness of 0.7 nm to 9 nm that comprises at least one uppermost layer made of one of the group consisting of an aluminum oxide, a beryllium aluminum oxide, a beryllium magnesium aluminum oxide, a titanium oxide, a magnesium oxide, a magnesium aluminum oxide, a manganese oxide, a nickel aluminum oxide, a sodium titanium oxide, an antimony oxide, a cerium titanium oxide, a cerium oxide, a strontium oxide, a zirconium oxide, a yttrium oxide, a rhodium oxide, a hafnium oxide, a boron oxide, a beryllium oxide, a calcium titanium oxide, a silicon nitride, a boron nitride, a silicon oxide, and a silicon carbide, and a lower coating system having a thickness of 1 nm to 16 nm that comprises at least one layer made of one of the group consisting of B x C y with x≠4 and y≠1, Mo x B y , B x N y , Si x N y , Si x C y , Be x O y , Si x O y , Ti, Ti x N y , Cu x Au y , Ni, Rh, Ir, Au, Pd, Pt, Os, Sm, Gd, Al x O y , K x Cl y , K, Hf, Th x F y , Na x F y , Li x F y , Mg x F y , La x F y , amorphous carbon, Y, Nb, Rh x O y , Ru x O y , Ce, and Si x H y .