Replacement apparatus for an optical element

1. A replacement apparatus for an optical element of a lithography objective, the apparatus comprising:

a holder configured to be selectively securable to an optical element; and

a housing for a lithography objective, the housing having means to receive the holder.

2. The apparatus of claim 1 further comprising at least one actuator to adjust the alignment of the optical element within the lithography objective.

3. The apparatus of claim 1 further comprising a holding structure to affix the optical element in the lithography objective, the holding structure being a separate structure from the holder.

4. The apparatus of claim 1 , wherein the lithography objective substantially encloses the optical element.

5. The apparatus of claim 1 , wherein the optical element is removably secured in the lithography objective.

6. The apparatus of claim 1 , wherein the optical element is secured between two optical elements permanently affixed in the lithography objective.

7. The apparatus of claim 1 further comprising a seal over the means.

8. The apparatus of claim 1 , wherein the optical element is a single composition of material and is devoid of additional structure.

9. The apparatus of claim 1 , wherein the optical element comprises a diameter that is different from at least one other diameter of another optical element positioned in the lithography objective.

10. A replacement apparatus for an optical element of a lithography objective, the apparatus comprising:

a holder to position an optical element in a lithography objective;

a housing for a lithography objective, the housing having a means to receive the holder and the optical element; and

a seal over the means.

11. The apparatus of claim 10 , further comprising an actuator in the lithography objective, the actuator configured to adjust the alignment of the optical element.

12. The apparatus of claim 10 , wherein the means allows the optical element to be positioned below a permanently secured optical element within the lithography objective.

13. A replacement apparatus for an optical element of a lithography objective, the apparatus comprising:

a holder configured to be selectively securable to an optical element;

a housing for a lithography objective, the housing having a means to receive the holder; and

wherein the optical element is isostatically mounted in the housing of the lithography objective.

14. The apparatus of claim 13 further comprising at least one actuator to adjust the alignment of the optical element within the lithography objective.

15. The apparatus of claim 13 further comprising at least one spring element to support the optical element in the lithography objective.

16. The apparatus of claim 13 further comprising a holding structure that provides the isostatically mounting of the optical element in the lithography objective.

17. A replacement apparatus for an optical element of a lithography objective, the apparatus comprising:

a holder configured to be selectively securable to an optical element;

a housing for a lithography objective, the housing having a means to receive the holder; and

at least one spring element to support the optical element in the lithography objective.

18. A replacement apparatus for an optical element of a lithography objective, the apparatus comprising:

a holder to position an optical element in a lithography objective;

a housing for a lithography objective, the housing having a means to receive the holder and the optical element;

a seal over the means; and an isostatic mount in the lithography objective to secure the optical element.

19. A replacement apparatus for an optical element of a lithography objective, the apparatus comprising:

a holder to position an optical element in a lithography objective;

a housing for a lithography objective, the housing having a means to receive the holder and the optical element;

a seal over the means; and

wherein the optical element is removably secured to the holder.