Illumination system of a microlithographic projection exposure apparatus

1. An illumination system, comprising:

a polarization manipulator configured to variably adjust a change in polarization state of light impinging thereon; and

a mirror arrangement comprising a plurality of mirror elements displaceable independently of each other to alter an angle distribution of the light reflected by the mirror arrangement,

wherein:

the illumination system is configured to be used in a microlithographic projection exposure apparatus,

a change in intensity distribution of the light caused by the polarization manipulator in a plane of the projection exposure apparatus can be at least partially compensated by the mirror arrangement, and

the mirror arrangement is upstream of the polarization manipulator in a path of the light through the illumination system.

2. The illumination system as set forth in claim 1 , further comprising a microlens arrangement comprising a plurality of microlenses.

3. The illumination system as set forth in claim 1 , further comprising an intensity measuring device to measure the intensity distribution of the light in the plane of the projection exposure apparatus.

4. The illumination system as set forth in claim 3 , further comprising a temperature measuring device to measure temperature at the polarization manipulator.

5. The illumination system as set forth in claim 4 , further comprising a control device to actuate the mirror arrangement depending on an output signal of the intensity measuring device and/or the temperature measuring device.

6. The illumination system as set forth in claim 1 , wherein the plurality of mirror elements are displaceable in an angle range of between −10° and +10°.

7. The illumination system as set forth in claim 1 , wherein at least one of the following illumination settings is adjustable by the mirror arrangement: a) a quadrupole illumination setting; b) a dipole illumination setting; c) and an annular illumination setting.

8. The illumination system as set forth in claim 1 , wherein the mirror arrangement is configured so that it alone produces an annular intensity distribution.

9. The illumination system as set forth in claim 1 , wherein the polarization manipulator is in a pupil plane of the illumination system.

10. The illumination system as set forth in claim 1 , wherein the polarization manipulator comprises at least two subelements arranged movably relative to each other.

11. The illumination system as set forth in claim 1 , wherein the polarization manipulator comprises a plurality of polarization rotators configured to cause a rotation of the polarization direction of the light through a variably adjustable rotational angle.

12. The illumination system as set forth in claim 11 , wherein each of the plurality of polarization rotators comprises a pair of deflection prisms movable relative to each other.

13. The illumination system as set forth in claim 11 , wherein the polarization rotators are arranged along the circumference of a circle, and an optical axis of the illumination system extends through a center point of the circle.

14. The illumination system as set forth in claim 13 , wherein the polarization rotators are interrupted along the circumference of the circle in at least two mutually opposite regions in which none of the polarization rotators is disposed.

15. The illumination system as set forth in claim 10 , wherein the at least two subelements comprise optically active material.

16. The illumination system as set forth in claim 1 , wherein the polarization manipulator includes levorotatory optically active material and dextrorotatory optically active material.

17. The illumination system as set forth in claim 10 , wherein at least one of the at least two subelements has an opaque edge region on a light entrance surface and/or on a light exit surface.

18. The illumination system as set forth in claim 1 , further comprising a phase manipulator.

19. The illumination system as set forth in claim 18 , wherein the polarization manipulator is upstream of the phase manipulator in a light propagation direction.

20. An apparatus, comprising:

an illumination system as recited in claim 1 ; and

a projection objective,

wherein the apparatus is a microlithography projection exposure apparatus.