IP Library Assignment 016362/0544
Patent Assignment
Reel/Frame 016362/0544

Assignment of Assignor's Interest

Recorded: 2005-03-16 Pages: 2
Assignors
KODAMA, TOSHIO
Executed: 2005-02-25
HASUDA, MASAKATSU
Executed: 2005-02-25
FUJII, TOSHIAKI
Executed: 2005-02-25
IWASAKI, KOUJI
Executed: 2005-02-25
SUGIYAMA, YASUHIKO
Executed: 2005-02-25
TAKAGI, YASUYUKI
Executed: 2005-02-25
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Ion Beam Device and Ion Beam Processing Method, and Holder Member
Patent: 7,297,944 →
Application: 10/520,982 →
Publication: US 2005/0236587
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →