IP Library › Assignment 016407/0403
Patent Assignment
Reel/Frame 016407/0403

Assignment of Assignor's Interest

Recorded: 2005-03-30 Pages: 3
Assignors
HOSHI, TAKESHI
Executed: 2004-12-08
SAITO, TSUYOSHI
Executed: 2004-12-08
KIMURA, TAKAKO
Executed: 2004-12-02
DUSSARRAT, CHRISTIAN
Executed: 2004-12-02
YANAGITA, KAZUTAKA
Executed: 2004-12-02
Assignees
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
16-1 ONOGAWA, TSUKUBA, IBARAKI 305-8569, JAPAN
Covered Property (1)
Method for Producing Silicon Nitride Films and Process for Fabricating Semiconductor Devices Using Said Method
Patent: 7,351,670 →
Application: 11/020,712 →
Publication: US 2005/0158983
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 15, 2007
From: SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
To: L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
Reel/Frame 019963/0301 →