IP Library Assignment 019963/0301
Patent Assignment
Reel/Frame 019963/0301

Assignment of Assignor's Interest

Recorded: 2007-10-15 Pages: 3
Covered Property (1)
Method for Producing Silicon Nitride Films and Process for Fabricating Semiconductor Devices Using Said Method
Patent: 7,351,670 →
Application: 11/020,712 →
Publication: US 2005/0158983
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 30, 2005
From: HOSHI, TAKESHI; SAITO, TSUYOSHI; KIMURA, TAKAKO; DUSSARRAT, CHRISTIAN
To: L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE; SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
Reel/Frame 016407/0403 →