Patent Assignment
Reel/Frame 016417/0408
Assignment of Assignor's Interest
Recorded: 2004-08-25
Pages: 3
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME MINATO-KU, TOKYO, 108-8001, JAPAN
Covered Property
(1)
Monomer Having Fluorine-Containing Acetal or Ketal Structure, Polymer Thereof, and Chemical-Amplification-Type Resist Composition as Well as Process for Formation of Pattern with Use of the Same