Assignment of Assignor's Interest

Recorded: 2005-08-18 Received: 2005-08-18 Pages: 4

Assignor

MERCK PATENT GMBH

Executed: 2005-05-09

Assignee

BASF AKTIENGESELLSCHAFT

CARL-BOSCH-STRASSE 38, LUDWIGSHAFEN, DEX, 67056, GERMANY

Covered Properties (15)

Sealing Arrangement for Sealing a Gap Between Two Components Which Can Rotate in Relation to Each Other About a Common Rotational Axis

Application: 10/518,483 →

Seminconductor surface treatment and mixture used therein

Application: 10/533,944 →

Dicopper(I)Oxalate Complexes for Use as Precursor Substances in Metallic Copper Deposition

Application: 10/519,163 →

Method for the Purification of Corrosive Gases

Application: 10/472,846 →

Solutions and processes for removal of sidewall residue after dry etching

Application: 10/620,560 →

Galvanizing Solution for the Galvanic Deposition of Copper

Application: 10/070,000 →

Method for the Purification of Hydrogen Peroxide Solutions

Application: 10/296,172 →

Method for raw etching silicon solar cells

Application: 10/168,797 →

Method for Producing High-Purity Sulphuric Acid

Application: 10/168,869 →

Etching solution, containing hydrofluoric acid

Application: 10/031,787 →

Method for Producing High-Purity Hydrochloric Acid

Application: 10/110,064 →

Dispenser for Liquids

Application: 09/936,439 →

Dopant Pastes for the Production of P,Pt,and N,Nt Regions in Semiconductors

Application: 09/936,285 →

System for Conveying Liquids Without Pulsing

Application: 09/857,692 →

Supply System for Chemicals and Its Use

Application: 09/793,683 →