IP Library Assignment 016440/0454
Patent Assignment
Reel/Frame 016440/0454

Assignment of Assignor's Interest

Recorded: 2005-08-24 Pages: 2
Assignor
HUANG, KAO-SU
Executed: 2005-08-16
Assignee
UNITED MICROELECTRONICS CORP.
NO.3, LI-HSIN ROAD 2, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU CITY, TAIWAN
Covered Property (1)
Etching Process for Decreasing Mask Defect
Patent: 7,214,626 →
Application: 11/161,960 →
Publication: US 2007/0049036