IP Library Assignment 016464/0406
Patent Assignment
Reel/Frame 016464/0406

Assignment of Assignor's Interest

Recorded: 2005-04-18 Pages: 2
Assignors
KODAMA, TOSHIO
Executed: 2005-04-07
HASUDA, MASAKATSU
Executed: 2005-04-07
FUJII, TOSHIAKI
Executed: 2005-04-07
IWASAKI, KOUJI
Executed: 2005-04-07
SUGIYAMA, YASUHIKO
Executed: 2005-04-07
TAKAGI, YASUYUKI
Executed: 2005-04-07
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Ion Beam Device and Ion Beam Processing Method
Patent: 7,276,691 →
Application: 10/525,311 →
Publication: US 2006/0163497
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →