IP Library Assignment 016815/0553
Patent Assignment
Reel/Frame 016815/0553

Assignment of Assignor's Interest

Recorded: 2005-09-19 Pages: 3
Assignor
TAKAOKA, OSAMU
Executed: 2005-08-22
Assignee
SII NANO TECHNOLOGY INC.
8 NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Method of Correcting Amplitude Defect in Multilayer Film of Euvl Mask
Patent: 7,189,655 →
Application: 11/195,982 →
Publication: US 2006/0040418
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →