Patent Assignment
Reel/Frame 033764/0615
Change of Name
Recorded: 2014-09-17
Pages: 23
Assignor
SII NANOTECHNOLOGY INC.
Executed: 2013-01-01
Assignee
HITACHI HIGH-TECH SCIENCE CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-0003, JAPAN
Covered Properties
(91)
Analyzing Method and Apparatus for Minute Foreign Substances, and Manufacturing Methods for Manufacturing Semiconductor Device and Liquid Crystal Display Device Using the Same
Patent:
5,877,035 →
Application:
08/600,141 →
Method for Analyzing Minute Foreign Substance Elements
Patent:
6,124,142 →
Application:
08/600,142 →
Thermomechanical Analyzer Equipped with a Thermogravimetry Function
Patent:
5,826,983 →
Application:
08/678,045 →
Sample Container Sealer Having Function of Setting Load
Patent:
5,718,097 →
Application:
08/688,497 →
Plasma Ion Mass Analyzing Apparatus
Patent:
6,031,379 →
Application:
08/724,996 →
Thermogravimetric Instrument
Patent:
6,057,516 →
Application:
08/896,664 →
Ion Beam Working Apparatus
Patent:
6,118,122 →
Application:
08/922,892 →
Focused Ion Beam Optical Axis Adjustment Method and Focused Ion Beam Apparatus
Patent:
5,969,355 →
Application:
08/923,562 →
Fluorescent X-Ray Spectroscope
Patent:
6,154,517 →
Application:
09/064,332 →
Analyzing Method and Apparatus for Minute Foreign Substances, and Manufacturing Methods for Manufacturing Semiconductor Device and Liquid Crystal Display Device Using the Same
Patent:
6,255,127 →
Application:
09/187,938 →
Thin Piece Forming Method
Patent:
6,527,967 →
Application:
09/356,234 →
Method and Apparatus for Adjusting a Charged Particle Beam of a Beam Optical System
Patent:
6,437,330 →
Application:
09/360,338 →
Thermo-Mechanical Analyzer
Patent:
6,599,010 →
Application:
09/517,673 →
Electric Discharge Detection Circuit
Automatic Focusing System for Scanning Electron Microscope Equipped with Laser Defect Detection Function
Focused Ion Beam Apparatus
Probe and Small Sample Pick Up Mechanism
Method of Correcting Amplitude Defect in Multilayer Film of Euvl Mask
X-Ray Fluorescent Analysis Apparatus
Method of Determining Processing Position in Charged Particle Beam Apparatus, and Infrared Microscope Used in the Method
Focused Ion Beam Processing Method
Charged Particle Beam Scan and Irradiation Method, Charged Particle Beam Apparatus, Workpiece Observation Method and Workpiece Processing Method
Differential Scanning Calorimeter
Sample Holding Mechanism and Sample Working/Observing Apparatus
Focused Ion Beam Apparatus and Method of Preparing/Observing Sample
Freezing Point Temperature Measuring Method and Temperature Calibrating Method in Differential Scanning Calorimetry
Fluorescent X-Ray Analysis Apparatus
Wafer Holder and Sample Producing Apparatus Using It
Fluorescent X-Ray Analysis Apparatus
Method of Correcting Opaque Defect of Photomask Using Atomic Force Microscope Fine Processing Device
Semiconductor Mask Correcting Device and Semiconductor Mask Correcting Method
Fluorescent X-Ray Analysis Apparatus
Fluorescent X-Ray Analysis Apparatus
Fluorescent X-Ray Analysis Apparatus
Thermal Analyzer
Micro-Machining Dust Removing Device, Micro-Machining Apparatus, and Micro-Machining Dust Removing Method
Energy Dispersion Type Radiation Detecting System and Method of Measuring Content of Object Element
Method and Apparatus of Measuring Thin Film Sample and Method and Apparatus of Fabricating Thin Film Sample
Scanning Type Probe Microscope
Optical Displacement-Detecting Mechanism and Probe Microscope Using the Same
Focused Ion Beam Apparatus and Sample Section Forming and Thin-Piece Sample Preparing Methods
Thermal Analysis Apparatus
Optical Displacement Detection Mechanism and Surface Information Measurement Device Using the Same
Scanning Probe Microscope Displacement Detecting Mechanism and Scanning Probe Microscope Using Same
Scanning Probe Microscope Fine-Movement Mechanism and Scanning Probe Microscope Using Same
X-Ray Analysis Apparatus
Stage for Working, Focused Beam Working Apparatus and Focused Beam Working Method
Thermal Analysis System and Method of Drying the Same
Sample Operation Apparatus
Sample Operation Apparatus
Method of Manufacturing Sample for Atom Probe Analysis by Fib and Focused Ion Beam Apparatus Implementing the Same
Method of Fabricating Grabbing Face of Sample Grabbing Portion
Scanning Probe Microscope and Scanning Method
Differential Scanning Calorimeter
X-Ray Analysis Apparatus and X-Ray Analysis Method
X-Ray Tube and X-Ray Analyzing Apparatus
Heat Flow Flux Type Differential Scanning Calorimeter
Focused Ion Beam Apparatus
Apparatus for Working and Observing Samples and Method of Working and Observing Cross Sections
Sample Relocation Method in Charged Particle Beam Apparatus and Charged Particle Beam Apparatus as Well as Sample for Transmission Electron Microscope
Sample Manipulating Apparatus
Positioning Apparatus and Scanning Probe Microscope Employing the Same
Composite Charged-Particle Beam System
X-Ray Tube and X-Ray Analysis Apparatus
X-Ray Tube and X-Ray Analysis Apparatus
Charged-Particle Beam Apparatus
Method of Preparing a Transmission Electron Microscope Sample and a Sample Piece for a Transmission Electron Microscope
Piezoelectric Actuator Provided with a Displacement Meter, Piezoelectric Element, and Positioning Device
X-Ray Analyzer
X-Ray Analysis Apparatus and X-Ray Analysis Method
Apparatus Structure and Scanning Probe Microscope Including Apparatus Structure
Sensor for Observations in Liquid Environments and Observation Apparatus for Use in Liquid Environments
X-Ray Analysis Apparatus and X-Ray Analysis Method
Probe Aligning Method for Probe Microscope and Probe Microscope Operated by the Same
X-Ray Analyzer and X-Ray Analysis Method
X-Ray Analyzer and X-Ray Analysis Method
Element Mapping Apparatus and Element Mapping Image Display Method
Cantilever, Cantilever System, and Probe Microscope and Adsorption Mass Sensor Including the Cantilever System
Focused Ion Beam Apparatus, Sample Processing Method Using the Same, and Computer Program for Focused Ion Beam Processing
Approach Method for Probe and Sample in Scanning Probe Microscope
Focused Ion Beam System and Sample Processing Method Using the Same
Micro Cross-Section Processing Method
Focused Ion Beam Apparatus
X-Ray Analysis Apparatus and X-Ray Analysis Method
Method and Apparatus for Cross-Section Processing and Observation
Differential Scanning Calorimeter
X-Ray Analyzer and Mapping Method for an X-Ray Analysis
X-Ray Fluorescence Analyzer and X-Ray Fluorescence Analysis Method
Viscoelasticity Measuring Apparatus
X-Ray Analyzer
Method of Determining a Spring Constant of a Cantilever and Scanning Probe Microscope Using the Method
Related Assignments
(14)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 22, 2003
From: IKKU, YUTAKA
To: SEIKO INSTRUMENTS INC.
Reel/Frame 014514/0453 →
Assignment of Assignor's Interest
Jul 15, 2004
From: SEIKO INSTRUMENTS, INC.
To: SII NANO TECHNOLOGY, INC.
Reel/Frame 015561/0327 →
Assignment of Assignor's Interest
Jul 15, 2004
From: SEIKO INSTRUMENTS, INC.
To: SII NANOTECHNOLOGY, INC.
Reel/Frame 015561/0273 →
Assignment of Assignor's Interest
Aug 19, 2004
From: SEIKO INSTRUMENTS, INC.
To: SII NANO TECHNOLOGY, INC.
Reel/Frame 015074/0123 →
Assignment of Assignor's Interest
Mar 8, 2005
From: SEIKO INSTRUMENTS INC.
To: SII NANO TECHNOLOGY INC.
Reel/Frame 016334/0537 →
Assignment of Assignor's Interest
Jul 11, 2005
From: SEIKO INSTRUMENTS INC.
To: SII NANO TECHNOLOGY INC.
Reel/Frame 016761/0519 →
Assignment of Assignor's Interest
Aug 26, 2005
From: MUNEKANE, MASANAO; IWASAKI, KOUJI; KONNO, TAKASHI; HAYASHI, HIROKI
To: SII NANO TECHNOLOGY INC.; AOI ELECTRONICS CO., LTD.
Reel/Frame 016672/0213 →
Assignment of Assignor's Interest
Sep 19, 2005
From: TAKAOKA, OSAMU
To: SII NANO TECHNOLOGY INC.
Reel/Frame 016815/0553 →
Assignment of Assignor's Interest
Jan 4, 2006
From: MATOBA, YOSHIKI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 017161/0871 →
Assignment of Assignor's Interest
Feb 8, 2006
From: KIYOHARA, MASAHIRO; SATO, MAKOTO; ASAHATA, TATSUYA
To: SII NANO TECHNOLOGY INC.
Reel/Frame 017246/0103 →
Assignment of Assignor's Interest
Jan 26, 2007
From: HAGIWARA, RYOJI; SUGIYAMA, YASUHIKO; KOZAKAI, TOMOKAZU
To: SII NANO TECHNOLOGY INC.
Reel/Frame 018844/0273 →
Assignment of Assignor's Interest
Oct 17, 2007
From: OOKUBO, NORIO
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019972/0184 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →