IP Library Assignment 072903/0543
Patent Assignment
Reel/Frame 072903/0543

Change of Address

Recorded: 2025-09-17 Pages: 12
Assignor
Assignee
HITACHI HIGH-TECH SCIENCE CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, 105-6411, JAPAN
Covered Properties (50)
Processing Apparatus Using Focused Charged Particle Beam
Patent: 7,518,125 →
Application: 11/501,629 →
Publication: US 2007/0040128
Charged Particle Beam Apparatus
Patent: 7,442,942 →
Application: 11/509,520 →
Publication: US 2007/0045560
Focused Ion Beam Processing Method
Patent: 7,576,340 →
Application: 11/542,434 →
Publication: US 2007/0158590
Charged Particle Beam Scan and Irradiation Method, Charged Particle Beam Apparatus, Workpiece Observation Method and Workpiece Processing Method
Patent: 7,485,880 →
Application: 11/586,190 →
Publication: US 2007/0114454
Sample Holding Mechanism and Sample Working/Observing Apparatus
Patent: 7,574,932 →
Application: 11/701,286 →
Publication: US 2008/0224374
Fluorescent X-Ray Analysis Apparatus
Patent: 7,634,053 →
Application: 11/708,789 →
Publication: US 2007/0211852
Wafer Holder and Sample Producing Apparatus Using It
Patent: 7,573,047 →
Application: 11/712,011 →
Publication: US 2008/0073562
Fluorescent X-Ray Analysis Apparatus
Patent: 7,428,293 →
Application: 11/729,247 →
Publication: US 2008/0013681
Method of Correcting Opaque Defect of Photomask Using Atomic Force Microscope Fine Processing Device
Patent: 7,571,639 →
Application: 11/796,996 →
Publication: US 2007/0281222
Semiconductor Mask Correcting Device and Semiconductor Mask Correcting Method
Patent: 7,644,387 →
Application: 11/796,997 →
Publication: US 2007/0262272
Working Method Utilizing Irradiation of Charged Particle Beam Onto Sample Through Passage in Gas Blowing Nozzle
Patent: 7,511,289 →
Application: 11/799,973 →
Publication: US 2007/0205376
Fluorescent X-Ray Analysis Apparatus
Patent: 7,424,093 →
Application: 11/805,665 →
Publication: US 2007/0274441
Energy Dispersion Type Radiation Detecting System and Method of Measuring Content of Object Element
Patent: 7,529,337 →
Application: 11/820,893 →
Publication: US 2008/0008293
Focused Ion Beam Apparatus and Sample Section Forming and Thin-Piece Sample Preparing Methods
Patent: 7,531,796 →
Application: 11/840,575 →
Publication: US 2008/0042059
Thermal Analysis Apparatus
Patent: 7,744,273 →
Application: 11/841,400 →
Publication: US 2008/0279249
Optical Displacement Detection Mechanism and Surface Information Measurement Device Using the Same
Patent: 7,973,942 →
Application: 11/841,445 →
Publication: US 2008/0049236
Method of Fabricating Grabbing Face of Sample Grabbing Portion
Patent: 7,951,303 →
Application: 11/960,304 →
Publication: US 2008/0156770
Apparatus for Working and Observing Samples and Method of Working and Observing Cross Sections
Patent: 7,755,044 →
Application: 12/047,013 →
Publication: US 2008/0224198
Sample Relocation Method in Charged Particle Beam Apparatus and Charged Particle Beam Apparatus as Well as Sample for Transmission Electron Microscope
Patent: 7,872,231 →
Application: 12/047,022 →
Publication: US 2008/0302961
Tweezer-Equipped Scanning Probe Microscope and Transfer Method
Patent: 7,987,703 →
Application: 12/130,311 →
Publication: US 2008/0295585
Composite Charged-Particle Beam System
Patent: 7,718,981 →
Application: 12/134,919 →
Publication: US 2008/0315088
Charged-Particle Beam Apparatus
Patent: 7,804,066 →
Application: 12/177,563 →
Publication: US 2009/0008572
Method of Preparing a Transmission Electron Microscope Sample and a Sample Piece for a Transmission Electron Microscope
Patent: 8,191,168 →
Application: 12/264,750 →
Publication: US 2009/0119807
Sample Preparing Device and Sample Posture Shifting Method
Patent: 8,198,603 →
Application: 12/290,397 →
Publication: US 2009/0114842
Charged Particle Beam Apparatus and Method Adjusting Axis of Aperture
Patent: 8,124,932 →
Application: 12/310,149 →
Publication: US 2009/0242757
X-Ray Analysis Apparatus and X-Ray Analysis Method
Patent: 7,623,627 →
Application: 12/369,062 →
Publication: US 2009/0213996
Charged Particle Beam Apparatus
Patent: 8,513,627 →
Application: 12/378,186 →
Publication: US 2009/0212239
Section Processing Method and Its Apparatus
Patent: 8,306,264 →
Application: 12/380,432 →
Publication: US 2010/0008563
Method for Fabricating Euvl Mask
Patent: 7,927,769 →
Application: 12/380,872 →
Publication: US 2009/0226825
Charged Particle Beam Apparatus and Method of Adjusting Charged Particle Optics
Patent: 8,698,105 →
Application: 12/449,633 →
Publication: US 2010/0116984
X-Ray Analyzer and X-Ray Analysis Method
Patent: 7,970,101 →
Application: 12/544,562 →
Publication: US 2010/0046700
X-Ray Analyzer and X-Ray Analysis Method
Patent: 8,000,439 →
Application: 12/544,572 →
Publication: US 2010/0046701
Element Mapping Apparatus and Element Mapping Image Display Method
Patent: 8,279,225 →
Application: 12/544,586 →
Publication: US 2010/0045659
Focused Ion Beam Apparatus, Sample Processing Method Using the Same, and Computer Program for Focused Ion Beam Processing
Patent: 8,426,830 →
Application: 12/613,107 →
Publication: US 2010/0155624
Differential Scanning Calorimeter
Patent: 8,342,744 →
Application: 12/658,828 →
Publication: US 2010/0220764
Cross Section Processing Method and Method of Manufacturing Cross Section Observation Sample
Patent: 8,703,247 →
Application: 12/693,580 →
Publication: US 2010/0189917
Approach Method for Probe and Sample in Scanning Probe Microscope
Patent: 8,024,816 →
Application: 12/700,236 →
Publication: US 2010/0205697
Focused Ion Beam System and Sample Processing Method Using the Same
Patent: 8,581,206 →
Application: 12/707,024 →
Publication: US 2010/0213386
Focused Ion Beam Apparatus
Patent: 8,513,602 →
Application: 12/712,863 →
Publication: US 2010/0219339
Composite Focused Ion Beam Device, and Processing Observation Method and Processing Method Using the Same
Patent: 8,269,194 →
Application: 12/733,089 →
Publication: US 2010/0176296
Photomask Defect Correcting Method and Device
Patent: 8,257,887 →
Application: 12/733,090 →
Publication: US 2010/0178601
Composite Focused Ion Beam Device, Process Observation Method Using the Same,and Processing Method
Patent: 8,274,063 →
Application: 12/733,091 →
Publication: US 2010/0288924
X-Ray Inspection Device and X-Ray Inspection Method
Patent: 8,422,630 →
Application: 12/802,401 →
Publication: US 2010/0316187
Thermal Analysis Apparatus
Patent: 8,359,180 →
Application: 12/806,997 →
Publication: US 2011/0054829
X-Ray Analysis Apparatus and X-Ray Analysis Method
Patent: 8,408,789 →
Application: 12/813,049 →
Publication: US 2011/0051894
Method and Apparatus for Cross-Section Processing and Observation
Patent: 8,542,275 →
Application: 12/880,626 →
Publication: US 2011/0063431
Electron Microscope and Specimen Analyzing Method
Patent: 8,664,598 →
Application: 12/931,411 →
Publication: US 2011/0186734
Focused ion beam apparatus
Patent: 8,389,953 →
Application: 12/931,993 →
Publication: US 2011/0204252
X-Ray Transmission Inspection Apparatus and X-Ray Transmission Inspection Method
Patent: 8,596,866 →
Application: 12/932,122 →
Publication: US 2011/0222656
Differential Scanning Calorimeter
Patent: 8,496,374 →
Application: 13/016,202 →
Publication: US 2011/0188534
Related Assignments (19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 10, 2006
From: YAMAMOTO, YO; TAKAHASHI, HARUO; FUJII, TOSHIAKI
To: SII NANOTECHNOLOGY INC.
Reel/Frame 018386/0639 →
Assignment of Assignor's Interest Oct 10, 2006
From: TAKAHASHI, HARUO; FUJII, TOSHIAKI; IKKU, YUTAKA; IWASAKI, KOUJI
To: SII NANOTECHNOLOGY INC.
Reel/Frame 018380/0803 →
Assignment of Assignor's Interest Jan 8, 2007
From: KOZAKAI, TOMOKAZU; MURAMATSU, MASASHI; HAGIWARA, RYOJI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 018776/0298 →
Assignment of Assignor's Interest Jan 26, 2007
From: HAGIWARA, RYOJI; SUGIYAMA, YASUHIKO; KOZAKAI, TOMOKAZU
To: SII NANO TECHNOLOGY INC.
Reel/Frame 018844/0273 →
Assignment of Assignor's Interest May 29, 2007
From: SUZUKI, HIROYUKI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019391/0862 →
Assignment of Assignor's Interest May 29, 2007
From: MATOBA, YOSHIKI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019391/0868 →
Assignment of Assignor's Interest Jun 18, 2007
From: FUKAI, TAKAYUKI; MATOBA, YOSHIKI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019473/0919 →
Assignment of Assignor's Interest Jul 23, 2007
From: DOI, TOSHIO; WATANABE, KAZUTOSHI; TAKAOKA, OSAMU; UEMOTO, ATSUSHI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019634/0044 →
Assignment of Assignor's Interest Jul 27, 2007
From: FUKAI, TAKAYUKI; MATOBA, YOSHIKI; TAKAHASHI, MASANORI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019659/0645 →
Assignment of Assignor's Interest Jul 27, 2007
From: KATO, KOKORO
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019645/0024 →
Assignment of Assignor's Interest Sep 13, 2007
From: HASUDA, MASAKATSU; OKABE, MAMORU
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019823/0039 →
Assignment of Assignor's Interest Sep 20, 2007
From: MATOBA, YOSHIKI; HASEGAWA, KIYOSHI; FUKAI, TAKAYUKI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019855/0191 →
Assignment of Assignor's Interest Oct 17, 2007
From: IYOKI, MASATO; YAMAMOTO, HIROYOSHI; WATANABE, KAZUTOSHI; SHIGENO, MASATSUGU
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019976/0473 →
Assignment of Assignor's Interest Oct 18, 2007
From: TASHIRO, JUNICHI; IKKU, YUTAKA; FUJII, TOSHIAKI
To: SII NANO TECHNOLOGY INC.
Reel/Frame 019980/0108 →
Assignment of Assignor's Interest Mar 19, 2008
From: MUNEKANE, MASANAO
To: SII NANOTECHNOLOGY INC.
Reel/Frame 020673/0009 →
Assignment of Assignor's Interest Jul 29, 2008
From: NAGASAWA, KANJI; NAKATANI, RINTARO
To: SII NANO TECHNOLOGY INC.
Reel/Frame 021309/0374 →
Change of Name Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →
Change of Name Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →