IP Library Granted Patent US 7,970,101
Granted Patent B2
US 7,970,101 · App. 12/544,562 · Granted Jun 28, 2011

X-ray analyzer and X-ray analysis method

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Quick Facts
Patent No.
US 7,970,101
App. No.
12/544,562
Granted
Jun 28, 2011
Kind
B2
Abstract

An X-ray tube which irradiates a primary X-ray to an irradiation point on a sample, an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information on the characteristic X-ray and scattered X-ray, an analyzer which analyzes the signal, a sample stage on which the sample is placed, a moving mechanism which moves the sample on the sample stage, the X-ray tube, and the X-ray detector relative to each other, a height measuring mechanism which measures a maximum height of the sample, and a control unit which adjusts the distance between the sample and the X-ray tube and the distance between the sample and the X-ray detector by controlling the moving mechanism on the basis of the measured maximum height of the sample, are included.

Claims (29)

1. An X-ray analyzer comprising:

a radiation source which irradiates a radial ray to an irradiation point on a sample;

an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information on the characteristic X-ray and scattered X-ray;

an analyzer which analyzes the signal;

a sample stage on which the sample is placed;

a moving mechanism which moves the sample on the sample stage, the radiation source, and the X-ray detector relative to each other;

a height measuring mechanism which measures a maximum height of the sample; and

a control unit which adjusts a distance between the sample and the radiation source and a distance between the sample and the X-ray detector by controlling the moving mechanism on the basis of the measured maximum height of the sample.

2. The X-ray analyzer according to claim 1 , further comprising:

a distance measuring unit which measures the distance between the irradiation point and the radiation source and the distance between the irradiation point and the X-ray detector,

wherein the control unit disposes the radiation source and the X-ray detector above the maximum height of the sample using the moving mechanism when the height of the irradiation point is lower than the maximum height of the sample, and corrects a parameter which is used in calculation for quantitative analysis according to a difference between a standard irradiation position of a radial ray and a height position of the irradiation point measured by the distance measuring unit when performing the calculation on the basis of data analyzed by the analyzer.

3. The X-ray analyzer according to claim 1 ,

wherein the height measuring mechanism comprises a laser light source that emits a laser light and has a function of calculating the maximum height of the sample on the basis of the amount of blocked light or light blocking position when the laser light is blocked by the sample or the amount of reflected light when the laser light is reflected by the sample by changing the positional relationship between the sample and laser light relative to each other while irradiating the laser light onto the sample.

4. The X-ray analyzer according to claim 1 ,

wherein the height measuring mechanism is provided to measure the maximum height of the sample in a state where the sample is placed on the sample stage.

5. The X-ray analyzer according to claim 1 ,

wherein the sample is built in a housing formed of a material allowing the radial ray to be transmitted therethrough, and

the height measuring mechanism measures a maximum height of the housing as the maximum height of the sample.

6. An X-ray analysis method of irradiating a radial ray from a radiation source to an irradiation point on a sample, detecting a characteristic X-ray and a scattered X-ray emitted from the sample and outputting a signal including energy information on the characteristic X-ray and scattered X-ray by an X-ray detector, and analyzing the signal by an analyzer, the method comprising:

measuring a maximum height of the sample by a height measuring mechanism; and

determining a position of an irradiation point by moving the sample on a sample stage, the radiation source, and the X-ray detector relative to each other by a moving mechanism,

wherein determining the position of the irradiation point comprises adjusting a distance between the sample and the radiation source and a distance between the sample and the X-ray detector by controlling the moving mechanism on the basis of the measured maximum height of the sample.

7. The X-ray analysis method according to claim 6 , further comprising:

disposing the radiation source and the X-ray detector above the maximum height of the sample by the control unit using the moving mechanism when the height of the irradiation point is lower than the maximum height of the sample; and

measuring the distance between the irradiation point and the radiation source and the distance between the irradiation point and the X-ray detector by a distance measuring unit after determining the position of the irradiation point,

wherein the control unit corrects a parameter which is used in calculation for quantitative analysis according to a difference between a standard irradiation position of a radial ray and a height position of the irradiation point when performing the calculation on the basis of data acquired by the analyzer.

8. The X-ray analysis method according to claim 6 ,

wherein the sample is built in a housing formed of a material allowing the radial ray to be transmitted therethrough, and

the maximum height of the housing is measured as the maximum height of the sample in the measuring of the maximum height.

Assignments (4)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →
CHANGE OF NAME Recorded Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 20, 2009
From: SAKAI, NORIAKI; TAKAHARA, TOSHIYUKI; MATOBA, YOSHIKI
To: SII NANOTECHNOLOGY INC.
Reel/Frame 023125/0182 →