Patent Assignment
Reel/Frame 018844/0273
Assignment of Assignor's Interest
Recorded: 2007-01-26
Pages: 3
Assignors
HAGIWARA, RYOJI
Executed: 2006-12-21
SUGIYAMA, YASUHIKO
Executed: 2007-01-05
KOZAKAI, TOMOKAZU
Executed: 2006-12-27
Assignee
SII NANO TECHNOLOGY INC.
8 NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Focused Ion Beam Processing Method
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →