IP Library Granted Patent US 8,000,439
Granted Patent B2
US 8,000,439 · App. 12/544,572 · Granted Aug 16, 2011

X-ray analyzer and X-ray analysis method

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,000,439
App. No.
12/544,572
Granted
Aug 16, 2011
Kind
B2
Abstract

An X-ray tube which irradiates a primary X-ray to an irradiation point on a sample, an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information of the characteristic X-ray and scattered X-ray, an analyzer which analyzes the signal, a first observation system which optically observes a surface of the sample in order to determine the irradiation point, and a second observation system which has a smaller depth of field than the first observation system, optically observes a narrow region, and measures the distance from the determined irradiation point by focus adjustment are included.

Claims (18)

1. An X-ray analyzer comprising:

a radiation source which irradiates a radial ray to an irradiation point on a sample;

an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information on the characteristic X-ray and scattered X-ray;

an analyzer which analyzes the signal;

a first observation system which optically observes a surface of the sample in order to determine the irradiation point; and

a second observation system which has a smaller depth of field than the first observation system, optically observes a narrow region, and measures a distance from the determined irradiation point by focus adjustment.

2. The X-ray analyzer according to claim 1 , further comprising:

a processing unit that calculates a distance between the radiation source and the irradiation point on the basis of the distance from the irradiation point measured by the second observation system and corrects a result analyzed by the analyzer according to the distance between the radiation source and the irradiation point.

3. The X-ray analyzer according to claim 1 , further comprising:

a sample stage on which the sample is placed; and

a moving mechanism which moves the sample stage between an observation region based on the first observation system and an observation region based on the second observation system,

wherein the first and second observation systems are disposed at different positions, and

an optical component of the second observation system is movably provided on an optical axis of a radial ray emitted from the radiation source.

4. An X-ray analysis method of irradiating a radial ray from a radiation source to an irradiation point on a sample, detecting a characteristic X-ray and a scattered X-ray emitted from the sample and outputting a signal including energy information of the characteristic X-ray and scattered X-ray by an X-ray detector, and analyzing the signal by an analyzer, the method comprising:

optically observing a surface of the sample using a first observation system in order to determine the irradiation point; and

measuring a distance from the determined irradiation point by focus adjustment using a second observation system which has a smaller depth of field than the first observation system and which optically observes a narrow region.

5. The X-ray analysis method according to claim 4 , further comprising:

calculating a distance between the radiation source and the irradiation point on the basis of the distance from the irradiation point measured by the second observation system and correcting a result analyzed by the analyzer according to the distance between the radiation source and the irradiation point using a processing unit.

Assignments (4)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →
CHANGE OF NAME Recorded Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 20, 2009
From: MATOBA, YOSHIKI
To: SII NANOTECHNOLOGY INC.
Reel/Frame 023126/0654 →