Patent Assignment
Reel/Frame 019634/0044
Assignment of Assignor's Interest
Recorded: 2007-07-23
Pages: 3
Assignors
DOI, TOSHIO
Executed: 2007-06-04
WATANABE, KAZUTOSHI
Executed: 2007-06-04
TAKAOKA, OSAMU
Executed: 2007-06-04
UEMOTO, ATSUSHI
Executed: 2007-06-04
Assignee
SII NANO TECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Method of Correcting Opaque Defect of Photomask Using Atomic Force Microscope Fine Processing Device
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →