Patent Assignment
Reel/Frame 018776/0298
Assignment of Assignor's Interest
Recorded: 2007-01-08
Pages: 3
Assignors
KOZAKAI, TOMOKAZU
Executed: 2006-12-13
MURAMATSU, MASASHI
Executed: 2006-12-14
HAGIWARA, RYOJI
Executed: 2006-12-18
Assignee
SII NANO TECHNOLOGY INC.
8 NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Charged Particle Beam Scan and Irradiation Method, Charged Particle Beam Apparatus, Workpiece Observation Method and Workpiece Processing Method
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →