IP Library Granted Patent US 8,598,485
Granted Patent B2
US 8,598,485 · App. 11/849,705 · Granted Dec 3, 2013

Stage for working, focused beam working apparatus and focused beam working method

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Quick Facts
Patent No.
US 8,598,485
App. No.
11/849,705
Granted
Dec 3, 2013
Kind
B2
Abstract

The present invention efficiently processes work pieces by transferring them without bringing them outside. The present invention comprises: a stage 4 for working, which is used when working a work piece D, L by irradiating a focused beam B while observing the work piece D, L in an observation region W of a previously determined range, and possessing a table 10 having plural mount bases 2, 3 on whose upper faces 2 a , 3 a there can be respectively mounted the work piece D, L; and a rotation slant means 11 rotating respectively the mount base 2, 3 about a Z-axis perpendicular to the upper faces 2 a , 3 a and slanting the upper faces 2 a , 3 a to an arbitrary angle, wherein the table 10 is made possible to move so as to dispose respectively the plural mount bases 2, 3 to an inside of the observation region W.

Claims (25)

1. A stage for working a work piece by irradiating a focused beam while observing the work piece in an observation region of a previously determined range, comprising:

a table having plural mount bases arranged so as to be juxtaposed in one row along a first direction, and

a retention means retaining the work piece in the observation region and separating the work piece at least from an upper face of at least one of the mount bases; and

a tilt means for rotating the table around a first axis extending in the first direction to an arbitrary angle such that the retention means slants together with the table while maintaining a mutual relative positional relationship between the table and the retention means.

2. A stage for working according to claim 1 , characterized in that:

the table comprises a rectangular shape extending in one direction when seen from above.

3. A focused beam working apparatus comprising:

a stage for working according to claim 1 ,

an observation means observing the work piece disposed in the observation region, and

an irradiation means irradiating the focused beam to the work piece disposed in the observation region.

4. A focused beam working method, comprising:

disposing one of plural mount bases in an observation region by moving a table having the plural mount bases,

separating a worked work piece from an upper face of the mount bases,

disposing a second mount base of the plural mount bases in the observation region by moving the table with the work piece retained by a retention means,

moving the separated work piece toward the second mount base to thereby bring the separated work piece in contact with a second work piece mounted on an upper face of the second mount base, and

irradiating a focused beam to bind the work piece and the second work piece, and

wherein during the irradiating the mount bases are tilted to a first angle under a state in which a mutual relative positional relationship between the table and the retention means is maintained.

5. A focused beam working method, comprising:

disposing one of plural mount bases in an observation region by moving a table having the plural mount bases,

producing a sample piece from the work piece by irradiating the focused beam while observing the work piece,

separating the sample piece from an upper face of the one of the plural mount bases;

disposing a second mount base of the plural mount bases in the observation region by moving the table with the sample piece retained by a retention means,

moving the separated sample piece toward the second mount base to thereby bring the separated sample piece in contact with a second work piece mounted on an upper face of the second mount base, and

irradiating the focused beam to bind the sample piece and the second work piece; and

wherein during the irradiating, the mount bases are tilted to a first angle under a state in which a mutual relative positional relationship between the table and the retention means is maintained.

Assignments (2)
CHANGE OF NAME Recorded Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 24, 2007
From: ADACHI, TATSUYA
To: SII NANO TECHNOLOGY INC.
Reel/Frame 020003/0989 →