IP Library Assignment 020003/0989
Patent Assignment
Reel/Frame 020003/0989

Assignment of Assignor's Interest

Recorded: 2007-10-24 Pages: 3
Assignor
ADACHI, TATSUYA
Executed: 2007-09-11
Assignee
SII NANO TECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Stage for Working, Focused Beam Working Apparatus and Focused Beam Working Method
Patent: 8,598,485 →
Application: 11/849,705 →
Publication: US 2008/0029492
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →