IP Library Granted Patent US 8,068,583
Granted Patent B2
US 8,068,583 · App. 12/494,851 · Granted Nov 29, 2011

X-ray analysis apparatus and X-ray analysis method

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Quick Facts
Patent No.
US 8,068,583
App. No.
12/494,851
Granted
Nov 29, 2011
Kind
B2
Abstract

Provided is an X-ray analysis apparatus including: an X-ray tubular bulb for irradiating a sample with a radiation beam; an X-ray detector for detecting a characteristic X-ray and a scattered X-ray and outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray; an analyzer for analyzing the signal; a sample stage capable of moving an irradiation point relatively with respect to the sample within a mapping area set in advance; and an X-ray mapping processing section for discriminating an X-ray intensity corresponding to a specific element, determining an intensity contrast in which a color or lightness is changed in accordance with the X-ray intensity, and for performing image display at a position corresponding to the irradiation point, in which the X-ray mapping processing section determines the intensity contrast of the X-ray intensity at the irradiation point by setting in advance the X-ray intensity discriminated as to a reference material in which a component element and a concentration thereof are known as a reference.

Claims (35)

1. An X-ray analysis apparatus, comprising:

a radiation source for irradiating an irradiation point on a sample with a radiation beam;

an X-ray detector for detecting a characteristic X-ray and a scattered X-ray which are radiated from the sample and outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray;

an analyzer for analyzing the signal;

a moving mechanism capable of moving the irradiation point relatively with respect to the sample within a mapping area set in advance; and

an X-ray mapping processing section for discriminating an X-ray intensity corresponding to a specific element arranged on the sample from an analysis result obtained by the analyzer, determining an intensity contrast in which one of a color and lightness is changed in accordance with the X-ray intensity, and performing image display at a position corresponding to the irradiation point of the mapping area,

wherein the X-ray mapping processing section sets in advance, as a reference, the X-ray intensity discriminated as to a reference material arranged on the sample on which the specific element is arranged and a component element and one of a concentration and a thickness of the reference material being known, and the X-ray mapping processing section determines the intensity contrast of the X-ray intensity of the specific element discriminated as to the reference at the irradiation point;

wherein a height of the reference material is set to be a height of the specific element arranged on the sample such that the X-ray mapping processing section determines the intensity contrast of the X-ray intensity when a distance from the X-ray detector to the reference material is equal to a distance from the X-ray detector to the specific element.

2. An X-ray analysis apparatus according to claim 1 , wherein:

the reference material is located within the mapping area; and

the X-ray mapping processing section discriminates the X-ray intensity of the reference material together with the sample and performs the image display.

3. An X-ray analysis apparatus according to claim 2 , wherein the reference material is placed on the sample.

4. An X-ray analysis apparatus according to claim 1 , wherein the X-ray mapping processing section sets an average value of the X-ray intensities of the reference material within a given area as the reference.

5. An X-ray analysis apparatus according to claim 1 , wherein the Xray mapping processing section sets the X-ray intensity of the reference material as one of an upper limit and a lower limit of the intensity contrast to perform the image display.

6. An X-ray analysis apparatus according to claim 1 , wherein the X-ray mapping processing section is capable of superimposing an image of the X-ray intensity and one of an optical microscope image and a secondary electron image of the sample on each other to be displayed.

7. An X-ray analysis apparatus according to claim 1 , wherein:

the sample is contained in a housing formed of a material through which the radiation beam can pass; and

the X-ray mapping processing section sets the X-ray intensity of the reference material as a reference, the X-ray intensity being measured in a state in which the reference material is covered with a cover member that is formed of the same material and has the same thickness as the housing.

8. An X-ray analysis method of irradiating an irradiation point on a sample with a radiation beam from a radiation source,

arranging a specific element and a reference material on the sample where a component element and one of a concentration and a thickness of the reference material are known, further comprising;

setting a height of the reference material to be a height of the specific element arranged on the sample;

detecting, with an X-ray detector, a characteristic X-ray and a scattered X-ray which are radiated from the sample;

detecting, with the X-ray detector, the characteristic X-ray and the scattered X-ray which are radiated from the reference material;

wherein a detection distance from the X-ray detector to the reference material is equal to the detection distance from the X-ray detector to the specific element;

outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray;

analyzing the signal with an analyzer;

moving, with a moving mechanism, the irradiation point relatively with respect to the sample within a mapping area set in advance; and

performing image display at a position corresponding to the irradiation point of the mapping area with an X-ray mapping processing section by discriminating an X-ray intensity corresponding to a specific element arranged on the sample from an analysis result of the X-ray intensity of the reference material obtained by the analyzer, and by determining an intensity contrast in which one of color and lightness is changed in accordance with the X-ray intensity,

wherein the performing image display includes setting in advance, as a reference, the X-ray intensity discriminated as to the reference material and determining, with the X-ray mapping processing section, the intensity contrast of the X-ray intensity of the specific element discriminated as to the reference at the irradiation point.

9. An X-ray analysis method according to claim 8 , wherein:

the reference material is located within the mapping area; and

the performing image display includes discriminating, with the X-ray mapping processing section, the X-ray intensity of the reference material together with the sample, and performing the image display.

10. An X-ray analysis method according to claim 8 , wherein:

the sample is contained in a housing formed of a material through which the radiation beam can pass; and

the performing image display includes setting the X-ray intensity of the reference material as a reference, the X-ray intensity being measured in a state in which the reference material is covered with a cover member that is formed of the same material and has the same thickness as the housing.

Assignments (2)
CHANGE OF NAME Recorded Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 30, 2009
From: MATOBA, YOSHIKI; NAGASAWA, KANJI
To: SII NANOTECHNOLOGY INC.
Reel/Frame 022894/0747 →