Patent Assignment
Reel/Frame 016821/0057
Assignment of Assignor's Interest
Recorded: 2005-08-01
Pages: 2
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA 261-8507, JAPAN
Covered Property
(1)
Photomask Defect Correction Method Employing a Combined Device of a Focused Electron Beam Device and an Atomic Force Microscope
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.