IP Library › Assignment 016858/0149
Patent Assignment
Reel/Frame 016858/0149

Assignment of Assignor's Interest

Recorded: 2005-07-27 Pages: 2
Assignors
TAKEUCHI, KOICHIRO
Executed: 2005-06-06
ISHITANI, TOHRU
Executed: 2005-06-06
OSE, YOICHI
Executed: 2005-06-07
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Focused Ion Beam Apparatus and Focused Ion Beam Irradiation Method
Patent: 7,411,192 →
Application: 11/189,901 →
Publication: US 2006/0022150
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →