Patent Assignment
Reel/Frame 016859/0004
Assignment of Assignor's Interest
Recorded: 2005-10-06
Pages: 2
Assignee
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)
KAPELDREEF 75, B-3001, LEUVEN, BELGIUM
Covered Property
(1)
Method of Reducing the Impact of Stray Light During Optical Lithography, Devices Obtained Thereof and Masks Used Therewith
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.