IP Library › Assignment 016953/0127
Patent Assignment
Reel/Frame 016953/0127

Assignment of Assignor's Interest

Recorded: 2005-09-07 Pages: 3
Assignors
HOSODA, MASAKI
Executed: 2005-08-04
MURAKI, MASATO
Executed: 2005-08-05
KAMIMURA, OSAMU
Executed: 2005-08-22
Assignees
CANON KABUSHIKI KAISHA
3-30-2, SHIMOMARUKO, OHTA-KU, TOKYO, JAPAN
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Charged Particle Beam Exposure Apparatus, Charged Particle Beam Exposure Method and Device Manufacturing Method
Patent: 7,173,262 →
Application: 11/159,356 →
Publication: US 2006/0017019
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →