IP Library Assignment 017078/0169
Patent Assignment
Reel/Frame 017078/0169

Corrected Form Cover Sheet Assignment Tp Caprrect Assogmee # 2'S Address Previously Recorded on Reel 016281 Frame 0026.

Recorded: 2005-10-11 Pages: 4
Assignors
SAITO, TSUYOSHI
Executed: 2004-12-13
ITOH, HIROMI
Executed: 2005-01-14
KITAZOE, MAKIKO
Executed: 2005-01-18
Assignees
ULVAC, INC.
2500, HAGISONO, CHIGAWAKI-SHI, KANAGAWA, 253-0071, JAPAN
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
16-1, ONOGAWA, TSUKUBA-SHI, IBARAKI 305-8569, JAPAN
Covered Property (1)
Method of Forming Silicon Nitride Film and Method of Manufacturing Semiconductor Device
Patent: 7,510,984 →
Application: 11/057,246 →
Publication: US 2005/0196977
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 15, 2005
From: SAITO, TSUYOSHI; ITOH, HIROMI; KITAZOE, MAKIKO
To: SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.; ULVAC, INC.
Reel/Frame 016281/0026 →
Assignment of Assignor's Interest Oct 9, 2006
From: SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
To: ULVAC, INC.
Reel/Frame 018379/0656 →