IP Library › Assignment 017133/0359
Patent Assignment
Reel/Frame 017133/0359

Assignment of Assignor's Interest

Recorded: 2005-10-24 Pages: 3
Assignors
ISHIBASHI, TAKEO
Executed: 2005-10-11
SAITO, TAKAYUKI
Executed: 2005-10-11
ITOH, MAYA
Executed: 2005-10-11
NAKAO, SHUJI
Executed: 2005-10-11
Assignee
RENESAS TECHNOLOGY CORP.
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Pattern Forming Method, Semiconductor Device Manufacturing Method and Exposure Mask Set
Patent: 7,459,265 →
Application: 11/255,877 →
Publication: US 2006/0088792
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 1, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024915/0526 →
Merger Sep 1, 2010
From: RENESAS TECHNOLOGY CORP.
To: NEC ELECTRONICS CORPORATION
Reel/Frame 024915/0556 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →