IP Library Assignment 017210/0469
Patent Assignment
Reel/Frame 017210/0469

Assignment of Assignor's Interest

Recorded: 2006-01-24 Pages: 3
Assignors
HIURA, HIDEFUMI
Executed: 2005-12-22
TADA, TETSUYA
Executed: 2005-12-22
KANAYAMA, TOSHIHIKO
Executed: 2005-12-22
Assignees
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
3-1, KASUMIGASEKI 1-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Dopant Material, Dopant Material Manufacturing Method, and Semiconductor Device Using the Same
Patent: 7,687,801 →
Application: 11/325,547 →
Publication: US 2010/0012923
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 11, 2010
From: NEC CORPORATION
To: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
Reel/Frame 023759/0262 →