IP Library Assignment 017238/0132
Patent Assignment
Reel/Frame 017238/0132

Assignment of Assignor's Interest

Recorded: 2006-03-01 Pages: 3
Assignor
LEE, MYOUNG-SOO
Executed: 2005-12-06
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Method of Correcting Deviations of Critical Dimensions of Patterns Formed on a Wafer in a Euvl Process
Patent: 7,247,412 →
Application: 11/319,245 →
Publication: US 2006/0147818