IP Library › Assignment 017258/0784
Patent Assignment
Reel/Frame 017258/0784

Assignment of Assignor's Interest

Recorded: 2005-11-17 Pages: 8
Assignors
HATA, MITSUHIRO
Executed: 2005-11-07
RYOO, MAN-HYOUNG
Executed: 2005-11-07
WOO, SANG-GYUN
Executed: 2005-11-14
KIM, HYUN-WOO
Executed: 2005-11-15
YOON, JIN-YOUNG
Executed: 2005-11-07
HAH, JUNG-HWAN
Executed: 2005-11-07
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Top Coating Composition for Photoresist and Method of Forming Photoresist Pattern Using Same
Patent: 7,384,730 →
Application: 11/281,775 →
Publication: US 2006/0111550