Patent Assignment
Reel/Frame 017302/0766
Assignment of Assignor's Interest
Recorded: 2006-03-14
Pages: 4
Assignors
SEWELL, HARRY
Executed: 2005-12-20
BASELMANS, JOHANNES JACOBUS MATHEUS
Executed: 2005-12-22
Assignee
ASML HOLDING N.V.
DE RUN 6501, VELDHOVEN, NL-5504 DR, NETHERLANDS
Covered Property
(1)
Interferometric Lithography System and Method Used to Generate Equal Path Lengths of Interfering Beams
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.